Institute of Solid State Physics, Ulm University, D-89069 Ulm, Germany.
Beilstein J Nanotechnol. 2012;3:773-7. doi: 10.3762/bjnano.3.86. Epub 2012 Nov 20.
For many applications it is desirable to have nanoparticles positioned on top of a given substrate well separated from each other and arranged in arrays of a certain geometry. For this purpose, a method is introduced combining the bottom-up self-organization of precursor-loaded micelles providing Au nanoparticles (NPs), with top-down electron-beam lithography. As an example, 13 nm Au NPs are arranged in a square array with interparticle distances >1 µm on top of Si substrates. By using these NPs as masks for a subsequent reactive ion etching, the square pattern is transferred into Si as a corresponding array of nanopillars.
对于许多应用来说，希望纳米粒子位于特定衬底的顶部，彼此之间彼此之间很好地分离，并以一定的几何形状排列成阵列。为此，我们提出了一种方法，将负载有前体的胶束的自下而上的自组装与自上而下的电子束光刻相结合。例如，在 Si 衬底上，将 13nm 的 Au 纳米粒子排列成具有 >1 µm 粒子间距离的正方形阵列。通过将这些纳米粒子用作后续反应离子刻蚀的掩模，将正方形图案转移到 Si 中，形成相应的纳米柱阵列。
