Oliveira-Junior Osmir Batista, Buso Leonardo, Fujiy Fábio Hiroshi, Lombardo Geraldo Henrique Leao, Campos Fernanda, Sarmento Hugo Ramalho, Souza Rodrigo Othavio Assuncao
Department of Restorative Dentistry, Sao Paulo State University, Araraquara Dental School UNESP, Araraquara, Brazil.
Gen Dent. 2013 Jan-Feb;61(1):e4-8.
The aim of this study was to evaluate the influence of 2 different surface polishing procedures-glazing and manual polishing-on the roughness of ceramics processed by computer-aided design/computer-aided manufacturing (CAD/CAM) and conventional systems (stratification technique). Eighty ceramic discs (diameter: 8 mm, thickness: 1 mm) were prepared and divided among 8 groups (n = 10) according to the type of ceramic disc and polishing method: 4 GZ and 4 MP. Specimens were glazed according to each manufacturer's recommendations. Two silicone polishing points were used on the ceramic surface for manual polishing. Roughness was measured using a surface roughness tester. The roughness measurements were made along a distance of 2 mm on the sample surface and the speed of reading was 0.1 mm/s. Three measurements were taken for each sample. The data (μm) were statistically analyzed using analysis of variance (ANOVA) and Tukey's test (α = 0.05). Qualitative analysis was performed using scanning electron microscopy (SEM). The mean (± SD) roughness values obtained for GZ were: 1.1 ± 0.40 μm; 1.0 ± 0.31 μm; 1.6 ± 0.31 μm; and 2.2 ± 0.73 μm. For MP, the mean values were: 0.66 ± 0.13 μm; 0.43 ± 0.14 μm; 1.6 ± 0.55 μm; and 2.0 ± 0.63 μm. The mean roughness values were significantly affected by the ceramic type (P = 0.0001) and polishing technique (P = 0.0047). The SEM images confirmed the roughness data. The manually polished glass CAD/CAM ceramics promoted lower surface roughness than did the glazed feldspathic dental ceramics.
本研究的目的是评估两种不同的表面抛光程序——上釉和手工抛光——对通过计算机辅助设计/计算机辅助制造(CAD/CAM)和传统系统(分层技术)加工的陶瓷粗糙度的影响。制备了80个陶瓷圆盘(直径:8毫米,厚度:1毫米),并根据陶瓷圆盘类型和抛光方法分为8组(n = 10):4组上釉(GZ)和4组手工抛光(MP)。根据每个制造商的建议对试样进行上釉。在陶瓷表面使用两个硅胶抛光点进行手工抛光。使用表面粗糙度测试仪测量粗糙度。在样品表面沿2毫米的距离进行粗糙度测量,读取速度为0.1毫米/秒。每个样品进行三次测量。使用方差分析(ANOVA)和Tukey检验(α = 0.05)对数据(μm)进行统计分析。使用扫描电子显微镜(SEM)进行定性分析。GZ组获得的平均(±标准差)粗糙度值为:1.1±0.40μm;1.0±0.31μm;1.6±0.31μm;和2.2±0.73μm。对于MP组,平均值为:0.66±0.13μm;0.43±0.14μm;1.6±0.55μm;和2.0±0.63μm。平均粗糙度值受陶瓷类型(P = 0.0001)和抛光技术(P = 0.0047)的显著影响。SEM图像证实了粗糙度数据。手工抛光的玻璃CAD/CAM陶瓷比上釉的长石质牙科陶瓷具有更低的表面粗糙度。