Department of Electrical Engineering, Georgia Institute of Technology, Atlanta, GA, USA.
IEEE Trans Ultrason Ferroelectr Freq Control. 2011 Dec;58(12):2659-67. doi: 10.1109/TUFFC.2011.2128.
One of the most important promises of capacitive micromachined ultrasonic transducer (CMUT) technology is integration with electronics. This approach is required to minimize the parasitic capacitances in the receive mode, especially in catheter-based volumetric imaging arrays, for which the elements must be small. Furthermore, optimization of the available silicon area and minimized number of connections occurs when the CMUTs are fabricated directly above the associated electronics. Here, we describe successful fabrication and performance evaluation of CMUT arrays for intravascular imaging on custom-designed CMOS receiver electronics from a commercial IC foundry. The CMUT-on-CMOS process starts with surface isolation and mechanical planarization of the CMOS electronics to reduce topography. The rest of the CMUT fabrication is achieved by modifying a low-temperature micromachining process through the addition of a single mask and developing a dry etching step to produce sloped sidewalls for simple and reliable CMUT-to-CMOS interconnection. This CMUT-to-CMOS interconnect method reduced the parasitic capacitance by a factor of 200 when compared with a standard wire-bonding method. Characterization experiments indicate that the CMUT-on-CMOS elements are uniform in frequency response and are similar to CMUTs simultaneously fabricated on standard silicon wafers without electronics integration. Ex- periments on a 1.6-mm-diameter dual-ring CMUT array with a center frequency of 15 MHz show that both the CMUTs and the integrated CMOS electronics are fully functional. The SNR measurements indicate that the performance is adequate for imaging chronic total occlusions located 1 cm from the CMUT array.
电容式微机械超声换能器 (CMUT) 技术最重要的承诺之一是与电子设备的集成。这种方法是必需的,以最小化接收模式中的寄生电容,特别是在基于导管的体积成像阵列中,其中元件必须很小。此外,当 CMUT 直接在相关电子设备上方制造时,会优化可用硅面积和最小化连接数量。在这里,我们描述了在商业集成电路代工厂定制设计的 CMOS 接收器电子设备上进行血管内成像的 CMUT 阵列的成功制造和性能评估。CMUT-on-CMOS 工艺从 CMOS 电子设备的表面隔离和机械平面化开始,以降低形貌。通过添加单个掩模和开发用于产生倾斜侧壁的干法刻蚀步骤,修改低温微加工工艺,从而实现其余的 CMUT 制造,以实现简单可靠的 CMUT-CMOS 互连。与标准的引线键合方法相比,这种 CMUT-CMOS 互连方法将寄生电容降低了 200 倍。特征化实验表明,CMUT-on-CMOS 元件在频率响应方面是均匀的,并且与同时在没有电子集成的标准硅片上制造的 CMUT 相似。对具有 15 MHz 中心频率的 1.6 毫米直径双环 CMUT 阵列的实验表明,CMUT 和集成的 CMOS 电子设备都完全正常工作。信噪比测量表明,性能足以对距离 CMUT 阵列 1 厘米处的慢性完全闭塞进行成像。