Department of Chemistry, University College London, Christopher Ingold Laboratories, 20 Gordon Street, London, WC1H 0AJ, United Kingdom.
Dalton Trans. 2013 Jul 14;42(26):9406-22. doi: 10.1039/c3dt50607j. Epub 2013 Apr 30.
The production of thin films of materials has become the attention of a great deal of research throughout academia and industry worldwide owing to the array of applications which utilise them, including electronic devices, gas sensors, solar cells, window coatings and catalytic systems. Whilst a number of deposition techniques are in common use, chemical vapour deposition (CVD) is an attractive process for the production of a wide range of materials due to the control it offers over film composition, coverage and uniformity, even on large scales. Conventional CVD processes can be limited, however, by the need for suitably volatile precursors. Aerosol-assisted (AA)CVD is a solution-based process which relies on the solubility of the precursor, rather than its volatility and thus vastly extends the range of potentially applicable precursors. In addition, AACVD offers extra means to control film morphology and concurrently the properties of the deposited materials. In this perspective we discuss the AACVD process, the influence of deposition conditions on film characteristics and a number of materials and applications to which AACVD has been found beneficial.
由于利用它们的各种应用，包括电子设备、气体传感器、太阳能电池、窗涂层和催化系统，材料的薄膜生产已经引起了学术界和工业界的大量关注。虽然有许多沉积技术在广泛使用，但化学气相沉积（CVD）是一种很有吸引力的生产方法，因为它可以控制薄膜的组成、覆盖率和均匀性，即使在大规模生产中也是如此。然而，传统的 CVD 工艺可能受到合适的挥发性前体的限制。气溶胶辅助（AA）CVD 是一种基于溶液的工艺，它依赖于前体的溶解度，而不是其挥发性，从而极大地扩展了潜在适用前体的范围。此外，AACVD 提供了额外的控制薄膜形态和沉积材料性能的方法。在这篇观点文章中，我们讨论了 AACVD 工艺、沉积条件对薄膜特性的影响，以及 AACVD 已经发现对其有益的一些材料和应用。
