School of Chemistry, Trinity College Dublin , Dublin, 2, Ireland.
ACS Appl Mater Interfaces. 2013 Aug 14;5(15):6951-8. doi: 10.1021/am400963x. Epub 2013 Jul 12.
The metal-semiconductor contact is one of the most critical factors that determine the performance of semiconductor devices such as Schottky barrier diodes (SBDs). SBDs between conductive carbon thin films and silicon have attracted attention due to their high performance and potential low cost of fabrication. Here, we introduce impedance spectroscopy (IS) as a powerful technique to characterize such SBDs. The electrical and structural characteristics of carbon-silicon SBDs between silicon and two different types of conductive carbon thin films have been investigated. Modeling the data with an extended equivalent circuit model reveals the effects of the metal electrode contacts of SBDs for the first time. From dc current-voltage measurements, diode parameters including the ideality factor, the Schottky barrier height, and the series resistance are extracted. Through use of analysis with IS, additional information on the Schottky contact is obtained, such as the built-in potential and more reliable barrier height values. Thus, IS can be utilized to analyze interfaces between metals and semiconductors in great detail by electrical means.
金属-半导体接触是决定肖特基势垒二极管(SBD)等半导体器件性能的最关键因素之一。由于其高性能和潜在的低成本制造,导电碳薄膜和硅之间的 SBD 引起了人们的关注。在这里,我们介绍阻抗谱(IS)作为一种强大的技术来表征这种 SBD。研究了硅和两种不同类型的导电碳薄膜之间的碳-硅 SBD 的电学和结构特性。通过扩展等效电路模型对数据进行建模,首次揭示了 SBD 金属电极接触的影响。从直流电流-电压测量中,提取了包括理想因子、肖特基势垒高度和串联电阻在内的二极管参数。通过 IS 分析,可以获得有关肖特基接触的附加信息,例如内置电势和更可靠的势垒高度值。因此,IS 可以通过电学手段对金属和半导体之间的界面进行详细分析。