State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai, China.
Science. 2013 Aug 9;341(6146):640-3. doi: 10.1126/science.1240961.
As the semiconductor devices of integrated circuits approach the physical limitations of scaling, alternative transistor and memory designs are needed to achieve improvements in speed, density, and power consumption. We report on a transistor that uses an embedded tunneling field-effect transistor for charging and discharging the semi-floating gate. This transistor operates at low voltages (≤2.0 volts), with a large threshold voltage window of 3.1 volts, and can achieve ultra-high-speed writing operations (on time scales of ~1 nanosecond). A linear dependence of drain current on light intensity was observed when the transistor was exposed to light, so possible applications include image sensing with high density and performance.
随着集成电路的半导体器件接近尺寸缩小的物理极限,需要替代的晶体管和存储设计来提高速度、密度和功耗。我们报告了一种使用嵌入式隧穿场效应晶体管来为半浮栅充电和放电的晶体管。该晶体管在低电压(≤2.0 伏)下工作,具有 3.1 伏的大阈值电压窗口,并且可以实现超高速写入操作(在~1 纳秒的时间范围内)。当晶体管暴露在光下时,观察到漏极电流与光强度呈线性关系,因此可能的应用包括具有高密度和高性能的图像感应。