光滚动光刻（PRL）用于连续和可扩展的图案化，应用于柔性电子。
Photo-roll lithography (PRL) for continuous and scalable patterning with application in flexible electronics.
机构信息
Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan, 48109, USA; Department of Mechanical Engineering, University of Michigan, Ann Arbor, Michigan, 48109, USA.
出版信息
Adv Mater. 2013 Dec 3;25(45):6554-61. doi: 10.1002/adma.201303514. Epub 2013 Sep 8.
A novel nanofabrication methodology for continuous, scalable, and geometry-tunable lithography is developed, named photo-roll lithography (PRL), by integrating photolithography with rollable processing. As a flexible mask attached to a quartz cylinder containing a UV source rolls over a photoresistcoated substrate, PRL realizes continuous photolithographic fabrication of various micro/nanoscale patterns with geometry that is tunable by controlling mask-substrate motions.
提出了一种新型的纳米制造方法，称为光滚光刻（PRL），它将光刻技术与可滚动加工技术相结合，实现了连续、可扩展和几何可调的光刻。PRL 通过将附有石英圆筒的柔性掩模（圆筒中包含 UV 光源）在涂有光刻胶的基底上滚动，实现了各种微/纳米尺度图案的连续光刻制造，并且通过控制掩模-基底运动，可以实现几何形状的可调。
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