Solid State Physics, Lund University, Box 118, SE-221 00, Lund, Sweden.
Nanotechnology. 2013 Oct 18;24(41):415303. doi: 10.1088/0957-4484/24/41/415303. Epub 2013 Sep 24.
Etching is an essential tool for the creation of nanostructures, where patterned metal structures can be used as masks. Here, we investigate HCl gas etching of InP substrates decorated with Au nanoparticles, and find that the etch rate is strongly increased at the Au-InP interfaces. The {111}A facets of the InP are preferentially etched. The metal nanoparticles follow in the etch direction, thereby creating nanopores. The size and position of the pores is controlled by the Au nanoparticles, and we measure nanopores as thin as 20 nm with an aspect ratio of 25:1. The direction of the nanopores is influenced by the temperature and the substrate orientation, which we use to demonstrate lateral, vertical and inclined nanopores. We explain the process by a solid-liquid-vapor model, in which the liquid metal particle catalyzes the dissolution of the solid InP.
刻蚀是制造纳米结构的基本工具，其中图案化的金属结构可用作掩模。在这里，我们研究了 Au 纳米颗粒修饰的 InP 衬底的 HCl 气体刻蚀，发现 Au-InP 界面处的刻蚀速率大大增加。InP 的 {111}A 面优先被刻蚀。金属纳米颗粒沿着刻蚀方向移动，从而形成纳米孔。孔的大小和位置由 Au 纳米颗粒控制，我们测量到的纳米孔厚度可达 20nm，纵横比为 25:1。纳米孔的方向受温度和衬底取向的影响，我们利用这一点演示了侧向、垂直和倾斜的纳米孔。我们通过固-液-气模型解释了这个过程，其中液态金属颗粒催化了固体 InP 的溶解。
