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研究电化学氧化 5-羟色胺(5-HT)时多晶掺硼金刚石的成膜特性。

Investigation of film formation properties during electrochemical oxidation of serotonin (5-HT) at polycrystalline boron doped diamond.

机构信息

Department of Chemistry, University of Warwick, Coventry, CV4 7AL, UK.

出版信息

Phys Chem Chem Phys. 2013 Nov 7;15(41):18085-92. doi: 10.1039/c3cp53513d.

Abstract

The change in surface morphology of oxygen-terminated polycrystalline boron doped diamond (pBDD) during electrochemical oxidation of the neurotransmitter serotonin (5-HT), resulting in a corresponding deterioration of the current signal, is investigated for the first time using both high resolution ex situ and in situ microscopy under a range of different electrochemical conditions. In situ electrochemical-atomic force microscopy (EC-AFM) reveals the formation of a granular film over the surface, which grows faster at higher-doped regions of the electrode surface and increases in thickness with repetitive potential cycles. The film properties were investigated using both cyclic voltammetry, with a range of redox species varying in charge, and conducting-AFM. These studies reveal the film to be positively charged and electrically insulating. The extent to which the film forms during 5-HT oxidation could be significantly minimised using different electrochemical procedures, as verified by voltammetry and in situ EC-AFM. Finally, even after extensive film formation, the original current signal could be recovered simply by leaving the electrode at open circuit potential for a short period of time, highlighting the suitability of BDD electrodes for neurotransmitter detection.

摘要

首次使用高分辨率的非原位和原位显微镜在一系列不同的电化学条件下,研究了氧终止的多晶硼掺杂金刚石(pBDD)在神经递质 5-羟色胺(5-HT)电化学氧化过程中表面形态的变化,这导致电流信号相应恶化。原位电化学原子力显微镜(EC-AFM)揭示了在表面形成了一层颗粒状薄膜,在电极表面掺杂较高的区域生长更快,并且随着重复的电位循环厚度增加。使用不同电荷的一系列氧化还原物种的循环伏安法和导电-AFM 研究了薄膜的性能。这些研究表明该薄膜带正电且电绝缘。通过伏安法和原位 EC-AFM 验证,可以通过使用不同的电化学程序显著减少 5-HT 氧化过程中形成的薄膜的程度。最后,即使在形成了大量的薄膜后,只需将电极置于开路电位短时间,即可恢复原始电流信号,这突出了 BDD 电极用于神经递质检测的适用性。

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