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金属有机分子束外延法生长 InP 纳米线的选择区域汽液固过程中的遮蔽和掩模开口效应。

Shadowing and mask opening effects during selective-area vapor-liquid-solid growth of InP nanowires by metalorganic molecular beam epitaxy.

机构信息

Electrical Engineering Faculty, Technion-Israel Institute of Technology, Haifa 32000, Israel.

出版信息

Nanotechnology. 2013 Nov 29;24(47):475302. doi: 10.1088/0957-4484/24/47/475302. Epub 2013 Oct 31.

Abstract

Indium phosphide nanowires were grown by metalorganic molecular beam epitaxy using the selective-area vapor-liquid-solid method. We show experimentally and theoretically that the size of the annular opening around the nanowire has a major impact on nanowire growth rate. In addition, we observed a considerable reduction of the growth rate in dense two-dimensional arrays, in agreement with a calculation of the shadowing of the scattered precursors. Due to the impact of these effects on growth, they should be considered during selective-area vapor-liquid-solid nanowire epitaxy.

摘要

磷化铟纳米线通过金属有机分子束外延,采用选择性区域汽液固法生长。我们从实验和理论上证明,纳米线周围环形开口的大小对纳米线生长速率有重大影响。此外,我们在密集二维阵列中观察到生长速率有相当大的降低,这与散射前体遮蔽的计算结果一致。由于这些效应对生长的影响,在选择性区域汽液固纳米线外延中应考虑这些效应。

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