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几类过渡金属二卤族化合物的电子和热电性质

Electronic and thermoelectric properties of few-layer transition metal dichalcogenides.

机构信息

Department of Electrical Engineering, University of California, Riverside, California 92521-0204, USA.

Department of Physics and the Center of Theoretical and Computational Physics, The University of Hong Kong, Pokfulam Road, Hong Kong SAR, China.

出版信息

J Chem Phys. 2014 Mar 28;140(12):124710. doi: 10.1063/1.4869142.

Abstract

The electronic and thermoelectric properties of one to four monolayers of MoS2, MoSe2, WS2, and WSe2 are calculated. For few layer thicknesses, the near degeneracies of the conduction band K and Σ valleys and the valence band Γ and K valleys enhance the n-type and p-type thermoelectric performance. The interlayer hybridization and energy level splitting determine how the number of modes within kBT of a valley minimum changes with layer thickness. In all cases, the maximum ZT coincides with the greatest near-degeneracy within kBT of the band edge that results in the sharpest turn-on of the density of modes. The thickness at which this maximum occurs is, in general, not a monolayer. The transition from few layers to bulk is discussed. Effective masses, energy gaps, power-factors, and ZT values are tabulated for all materials and layer thicknesses.

摘要

我们计算了单层至四层 MoS2、MoSe2、WS2 和 WSe2 的电子和热电性质。对于少数层厚度,导带 K 和 Σ 谷以及价带 Γ 和 K 谷的近简并度增强了 n 型和 p 型热电性能。层间杂化和能级劈裂决定了谷最低值内 kBT 的模式数量如何随层厚度变化。在所有情况下,最大 ZT 与能带边缘 kBT 内最接近简并度相一致,从而导致模式密度的急剧开启。发生这种最大值的厚度通常不是单层。讨论了从少数层到体相的转变。为所有材料和层厚度列出了有效质量、能隙、功率因子和 ZT 值。

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