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通过替代原子进行局部和随机修饰的钼基二硫属化物单层的电子结构和热电性质。

Electronic structure and thermoelectric properties of Mo-based dichalcogenide monolayers locally and randomly modified by substitutional atoms.

作者信息

Vallinayagam M, Posselt M, Chandra S

机构信息

Helmholtz-Zentrum Dresden-Rossendorf, Institute of Ion Beam Physics and Materials Research Bautzner Landstraße 400 01328 Dresden Germany

Technische Universität Dresden 01062 Dresden Germany.

出版信息

RSC Adv. 2020 Nov 26;10(70):43035-43044. doi: 10.1039/d0ra08463h. eCollection 2020 Nov 23.

Abstract

Density functional theory and Boltzmann transport equations are used to investigate electronic band structure and thermoelectric (TE) properties of different two-dimensional (2D) materials containing Mo, S, Nb, Se, and Te. In MoS-based monolayers (MLs) the substitution of S atoms by Te atoms up to the concentration of 12.5 at% leads to a more significant change of the band structure than in the corresponding case with Se atoms. In particular, the bandgap is reduced. At a high concentration of Se or Te the electronic structure becomes more similar to that of the SeMoS or TeMoS Janus layers, and the MoSe or MoTe MLs. It is found that local and random introduction of substitutional Se or Te atoms yields not very different results. The substitution of Mo by Nb, at the concentration of 2.1 at% leads to hole levels. The thermoelectric properties of the considered 2D materials are quantified by the Seebeck coefficient and thermoelectric figure of merit. The two characteristics are determined for different levels of p- or n-doping of the MLs and for different temperatures. Compared to the pristine MoS ML, Te substitutional atoms cause more changes of the thermoelectric properties than Se atoms. However, MLs with Se substitutional atoms show a high thermoelectric figure of merit in a broader range of possible p- or n-doping levels. In most cases, the maximum thermoelectric figure of merit is about one, both in p- and n-type materials, and for temperatures between 300 and 1200 K. This is not only found for MoS-based MLs with substitutional atoms but also for the Janus layers and for MoSe or MoTe MLs. Interestingly, for MLs with one Nb as well as two or four Te substitutional atoms the highest values of the TE figure of merit of 1.2 and 1.40, respectively, are obtained at a temperature of 1200 K.

摘要

采用密度泛函理论和玻尔兹曼输运方程研究了含钼(Mo)、硫(S)、铌(Nb)、硒(Se)和碲(Te)的不同二维材料的电子能带结构和热电(TE)性质。在基于二硫化钼(MoS)的单层(MLs)中,用碲原子取代硫原子,浓度高达12.5原子百分比时,与用硒原子取代的相应情况相比,能带结构的变化更为显著。特别是,带隙减小。在高浓度的硒或碲下,电子结构变得更类似于硒钼硫(SeMoS)或碲钼硫(TeMoS)的Janus层以及二硒化钼(MoSe)或二碲化钼(MoTe)的MLs。研究发现,局部和随机引入取代性硒或碲原子产生的结果差异不大。用铌取代钼,浓度为2.1原子百分比时会产生空穴能级。通过塞贝克系数和热电优值对所考虑的二维材料的热电性质进行了量化。针对MLs不同的p型或n型掺杂水平以及不同温度确定了这两个特性。与原始的二硫化钼ML相比,碲取代原子引起的热电性质变化比硒原子更多。然而,含硒取代原子的MLs在更广泛的可能p型或n型掺杂水平范围内表现出较高的热电优值。在大多数情况下,p型和n型材料在300至1200K的温度范围内,最大热电优值约为1。这不仅在含取代原子的基于二硫化钼的MLs中发现,在Janus层以及二硒化钼或二碲化钼的MLs中也有发现。有趣的是,对于含有一个铌以及两个或四个碲取代原子的MLs,分别在1200K的温度下获得了最高的热电优值,分别为1.2和1.40。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5c3d/9058219/9530c1519125/d0ra08463h-f1.jpg

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