Kurra Narendra, Reifenberger Ronald G, Kulkarni Giridhar U
Chemistry and Physics of Materials Unit and DST Unit on Nanoscience, Jawaharlal Nehru Centre for Advanced Scientific Research , Jakkur PO, Bangalore 560 064, India.
ACS Appl Mater Interfaces. 2014 May 14;6(9):6147-63. doi: 10.1021/am500122g. Epub 2014 Apr 15.
Scanning probe techniques scanning tunneling microscopy (STM) and atomic force microscopy (AFM) have emerged as unique local probes for imaging, manipulation, and modification of surfaces at the nanoscale. Exercising the fabrication of atomic and nansocale devices with desired properties have demanded rapid development of scanning probe based nanolithographies. Dip pen nanolithography (DPN) and local anodic oxidation (LAO) have been widely employed for fabricating functional patterns and prototype devices at nanoscale. This review discusses the progress in AFM bias lithography with focus on nanocarbon species on which many functional quantum device structures have been realized using local electrochemical and electrostatic processes. As water meniscus is central to AFM bias lithography, the meniscus formation, estimation and visualization is discussed briefly. A number of graphene-based nanodevices have been realized on the basis AFM bias lithography in the form of nanoribbons, nanorings and quantum dots with sufficiently small dimensions to show quantum phenomena such as conductance fluctuations. Several studies involving graphitic surfaces and carbon nanotubes are also covered. AFM based scratching technique is another promising approach for the fabrication of nanogap electrodes, important in molecular electronics.
扫描探针技术，如扫描隧道显微镜（STM）和原子力显微镜（AFM），已成为用于纳米尺度表面成像、操纵和改性的独特局部探针。利用扫描探针纳米光刻技术快速制造具有所需特性的原子和纳米级器件，推动了该技术的迅速发展。蘸笔纳米光刻（DPN）和局部阳极氧化（LAO）已被广泛用于在纳米尺度上制造功能图案和原型器件。本综述讨论了AFM偏置光刻技术的进展，重点关注纳米碳材料，利用局部电化学和静电过程已在其上实现了许多功能量子器件结构。由于水弯月面是AFM偏置光刻技术的核心，因此简要讨论了弯月面的形成、估计和可视化。基于AFM偏置光刻技术，已经实现了许多基于石墨烯的纳米器件，包括纳米带、纳米环和量子点等形式，其尺寸足够小以显示量子现象，如电导涨落。还涵盖了一些涉及石墨表面和碳纳米管的研究。基于AFM的划痕技术是制造纳米间隙电极的另一种有前途的方法，这在分子电子学中很重要。
