Suppr超能文献

利用 X 射线布拉格投影叠层术对纳米级半导体异质结构进行应变成像。

Strain imaging of nanoscale semiconductor heterostructures with x-ray Bragg projection ptychography.

机构信息

Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, USA.

Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA.

出版信息

Phys Rev Lett. 2014 Apr 25;112(16):165502. doi: 10.1103/PhysRevLett.112.165502. Epub 2014 Apr 23.

Abstract

We report the imaging of nanoscale distributions of lattice strain and rotation in complementary components of lithographically engineered epitaxial thin film semiconductor heterostructures using synchrotron x-ray Bragg projection ptychography (BPP). We introduce a new analysis method that enables lattice rotation and out-of-plane strain to be determined independently from a single BPP phase reconstruction, and we apply it to two laterally adjacent, multiaxially stressed materials in a prototype channel device. These results quantitatively agree with mechanical modeling and demonstrate the ability of BPP to map out-of-plane lattice dilatation, a parameter critical to the performance of electronic materials.

摘要

我们利用同步加速器 X 射线布拉格投影叠层术(BPP),对光刻工程外延薄膜半导体异质结构的互补组件中的纳米级晶格应变和旋转分布进行成像。我们引入了一种新的分析方法,能够从单个 BPP 相位重建中独立确定晶格旋转和离面应变,并将其应用于原型通道器件中两个相邻的、多轴应力的材料。这些结果与力学模型定量吻合,并证明了 BPP 能够绘制出对电子材料性能至关重要的离面晶格膨胀参数。

文献AI研究员

20分钟写一篇综述,助力文献阅读效率提升50倍。

立即体验

用中文搜PubMed

大模型驱动的PubMed中文搜索引擎

马上搜索

文档翻译

学术文献翻译模型,支持多种主流文档格式。

立即体验