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湿蚀刻辅助胶体光刻:一种在任意衬底上制备纳米盘和纳米孔阵列的通用策略。

Wet etching-assisted colloidal lithography: a general strategy toward nanodisk and nanohole arrays on arbitrary substrates.

机构信息

Key Lab of Materials Physics, Anhui Key lab of Nanomaterials and Nanotechnology, Institute of Solid State Physics, Chinese Academy of Sciences , Hefei 230031, Anhui, P. R China.

出版信息

ACS Appl Mater Interfaces. 2014 Jun 25;6(12):9207-13. doi: 10.1021/am501326w. Epub 2014 Jun 3.

DOI:10.1021/am501326w
PMID:24858013
Abstract

A simple and facile strategy is presented to fabricate the metal nanodisk and nanohole arrays based on a wet etching-assisted polystyrene colloidal lithography. Gold is chosen to demonstrate the validity of such a strategy. The hexagonally arranged Au nanodisk and nanohole arrays are thus fabricated with large area and good uniformity. The structural parameters of the arrays, such as thicknesses, diameters, and spacings of the nanodisks or nanoholes, are facilely tunable and controllable by predeposition conditions, etching conditions and colloidal monolayer structure. More importantly, these arrays can be produced on any supporting substrates, such as conductive or nonconductive and even flexible substrates with flat, rough, or even curved surfaces. In general, the presented strategy is low in cost, simple in operation and arbitrary in substrate, and the as-prepared arrays could find potential devices' applications with nice compatibility in the fields of optics, surface-enhanced Raman spectroscopy, biosensing, and so forth.

摘要

提出了一种基于湿蚀刻辅助聚苯乙烯胶体光刻的制造金属纳米盘和纳米孔阵列的简单易行的策略。选择金来证明这种策略的有效性。因此,制备了大面积、均匀性好的六边形排列的 Au 纳米盘和纳米孔阵列。通过预沉积条件、蚀刻条件和胶体单层结构,阵列的结构参数(如纳米盘或纳米孔的厚度、直径和间距)可以很容易地进行调节和控制。更重要的是,这些阵列可以在任何支撑衬底上制备,例如导电或非导电,甚至具有平坦、粗糙甚至弯曲表面的柔性衬底。总的来说,所提出的策略成本低、操作简单、衬底任意,所制备的阵列在光学、表面增强拉曼光谱、生物传感等领域具有良好的兼容性,可能有潜在的器件应用。

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