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在SiO2/Si衬底上对二硫化钼/石墨烯异质结构进行光学识别。

Optical identification of MoS2/graphene heterostructure on SiO2/Si substrate.

作者信息

Xu Haiteng, He Dawei, Fu Ming, Wang Wenshuo, Wu Hongpeng, Wang Yongsheng

出版信息

Opt Express. 2014 Jun 30;22(13):15969-74. doi: 10.1364/OE.22.015969.

Abstract

Chemical vapor deposition (CVD) method is considered to be an efficient way to prepare Van der Waals heterostructure. However, accurately and hurtlessly identifying the layers number of MoS(2) in the heterostructure is still a challenge. Here, we calculated the expected contrast between MoS(2)/graphene heterostructure and underlying SiO(2)/Si substrate by using a Fresnel law based model. And we indicated that contrast at blue and green incident light is ideal for visibility and layer number detecting. Our measured value showed good agreement with calculated ones. And Raman spectrum helped to confirm our speculation.

摘要

化学气相沉积(CVD)方法被认为是制备范德华异质结构的有效途径。然而,准确且无损地识别异质结构中MoS₂的层数仍然是一项挑战。在此,我们通过使用基于菲涅耳定律的模型计算了MoS₂/石墨烯异质结构与下层SiO₂/Si衬底之间的预期对比度。并且我们指出,蓝色和绿色入射光下的对比度对于可见性和层数检测是理想的。我们的测量值与计算值显示出良好的一致性。拉曼光谱有助于证实我们的推测。

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