Wang Jer-Chyi, Karmakar Rajat Subhra, Lu Yu-Jen, Huang Chiung-Yin, Wei Kuo-Chen
Department of Electronic Engineering, Chang Gung University, Kweishan 33302, Taoyuan, Taiwan.
Department of Neurosurgery, Chang Gung Memorial Hospital, Kweishan 33305, Taoyuan, Taiwan.
Sensors (Basel). 2015 Jan 5;15(1):818-31. doi: 10.3390/s150100818.
The piezoresistive characteristics of poly(3,4-ethylenedioxythiophene):polystyrene sulfonate (PEDOT:PSS) pressure sensors with inter-digitated (IDE) and cross-point electrode (CPE) structures have been investigated. A small variation of the resistance of the pressure sensors with IDE without bottom indium-tin-oxide (b-ITO) film and with CPE structures was observed owing to the single carrier-conducting pathway. For the IDE pressure sensors with b-ITO, the piezoresistive characteristics at low and high pressure were similar to those of the pressure sensors with IDE without b-ITO and with CPE structures, respectively, leading to increased piezoresistive pressure sensitivity as the PEDOT:PSS film thickness decreased. A maximum sensitivity of more than 42 kΩ/Pa was achieved. When the normal pressure was applied, the increased number of conducting points or the reduced distance between the PEDOT oligomers within the PEDOT:PSS film resulted in a decrease of the resistance. The piezoresistive pressure sensors with a single carrier-conducting pathway, i.e., IDE without b-ITO and CPE structures, exhibited a small relaxation time and a superior reversible operation, which can be advantageous for fast piezoresistive response applications.
研究了具有叉指式(IDE)和交叉点电极(CPE)结构的聚(3,4-乙撑二氧噻吩):聚苯乙烯磺酸盐(PEDOT:PSS)压力传感器的压阻特性。由于单载流子传导路径,观察到没有底部氧化铟锡(b-ITO)薄膜的IDE压力传感器和具有CPE结构的压力传感器的电阻有微小变化。对于带有b-ITO的IDE压力传感器,其在低压和高压下的压阻特性分别与没有b-ITO的IDE压力传感器和具有CPE结构的压力传感器相似,随着PEDOT:PSS薄膜厚度的减小,压阻压力灵敏度增加。实现了超过42 kΩ/Pa的最大灵敏度。施加常压时,PEDOT:PSS薄膜内导电点数量的增加或PEDOT低聚物之间距离的减小导致电阻降低。具有单载流子传导路径的压阻压力传感器,即没有b-ITO的IDE和CPE结构,表现出较短的弛豫时间和出色的可逆操作,这对于快速压阻响应应用可能是有利的。