School of Electrical and Electronic Engineering, Chung-Ang University, Seoul, South Korea.
Adv Mater. 2015 Feb 18;27(7):1182-8. doi: 10.1002/adma.201404296. Epub 2015 Jan 7.
Incorporation of Zr into an AlOx matrix generates an intrinsically activated ZAO surface enabling the formation of a stable semiconducting IGZO film and good interfacial properties. Photochemically annealed metal-oxide devices and circuits with the optimized sol-gel ZAO dielectric and IGZO semiconductor layers demonstrate the high performance and electrically/mechanically stable operation of flexible electronics fabricated via a low-temperature solution process.
Zr 的掺入会生成固有激活的 ZAO 表面,从而形成稳定的半导体 IGZO 薄膜和良好的界面特性。经过光化学退火的金属氧化物器件和电路,采用优化的溶胶-凝胶 ZAO 电介质和 IGZO 半导体层,展示了通过低温溶液工艺制造的柔性电子器件的高性能和电/机械稳定运行。