Niu Wenbin, Li Xianglin, Karuturi Siva Krishna, Fam Derrick Wenhui, Fan Hongjin, Shrestha Santosh, Wong Lydia Helena, Tok Alfred Iing Yoong
School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, 639798, Singapore.
Nanotechnology. 2015 Feb 13;26(6):064001. doi: 10.1088/0957-4484/26/6/064001. Epub 2015 Jan 21.
Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells will be discussed. This is specifically focused on the fabrication of nanostructured photoelectrodes, surface passivation, surface sensitization, and band-structure engineering of solar cell materials. Challenges and future directions of ALD in the applications of solar cells are also discussed.
原子层沉积(ALD)为生长具有优异的一致性且厚度控制可达原子级别的薄膜提供了一种独特的工具。近年来,ALD在能源研究中的应用受到了越来越多的关注。在这篇综述中,将讨论ALD在太阳能电池中的多功能性。这特别聚焦于纳米结构光电极的制备、表面钝化、表面敏化以及太阳能电池材料的能带结构工程。还讨论了ALD在太阳能电池应用中的挑战和未来方向。