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非缓解期精神分裂症患者氧化应激和氧化 DNA 损伤增加。

Increased oxidative stress and oxidative DNA damage in non-remission schizophrenia patients.

机构信息

Department of Psychiatry, School of Medicine, Mustafa Kemal University, Hatay, Turkey.

Department of Psychiatry, School of Medicine, Gaziantep University, Gaziantep, Turkey.

出版信息

Psychiatry Res. 2015 Sep 30;229(1-2):200-5. doi: 10.1016/j.psychres.2015.07.036. Epub 2015 Jul 15.

Abstract

Increasing evidence shows that oxidative stress plays a role in the pathophysiology of schizophrenia. But there is not any study which examines the effects of oxidative stress on DNA in schizophrenia patients. Therefore we aimed to assess the oxidative stress levels and oxidative DNA damage in schizophrenia patients with and without symptomatic remission. A total of 64 schizophrenia patients (38 with symptomatic remission and 26 without symptomatic remission) and 80 healthy volunteers were included in the study. 8-hydroxydeoxyguanosine (8-OHdG), total oxidant status (TOS) and total antioxidant status (TAS) were measured in plasma. TOS, oxidative stress index (OSI) and 8-OHdG levels were significantly higher in non-remission schizophrenic (Non-R-Sch) patients than in the controls. TOS and OSI levels were significantly higher in remission schizophrenic (R-Sch) patients than in the controls. TAS level were significantly lower and TOS and OSI levels were significantly higher in R-Sch patients than in Non-R-Sch patients. Despite the ongoing oxidative stress in patients with both R-Sch and Non-R-Sch, oxidative DNA damage was higher in only Non-R-Sch patients compared to controls. It is suggested that oxidative stress can cause the disease via DNA damage, and oxidative stress plays a role in schizophrenia through oxidative DNA damage.

摘要

越来越多的证据表明,氧化应激在精神分裂症的病理生理学中起作用。但是,没有任何研究检查氧化应激对精神分裂症患者 DNA 的影响。因此,我们旨在评估有和无症状缓解的精神分裂症患者的氧化应激水平和氧化 DNA 损伤。共有 64 名精神分裂症患者(38 名有症状缓解,26 名无症状缓解)和 80 名健康志愿者纳入了这项研究。在血浆中测量了 8-羟基脱氧鸟苷(8-OHdG)、总氧化剂状态(TOS)和总抗氧化状态(TAS)。非缓解性精神分裂症(Non-R-Sch)患者的 TOS、氧化应激指数(OSI)和 8-OHdG 水平明显高于对照组。缓解性精神分裂症(R-Sch)患者的 TOS 和 OSI 水平明显高于对照组。TAS 水平明显降低,R-Sch 患者的 TOS 和 OSI 水平明显高于 Non-R-Sch 患者。尽管 R-Sch 和 Non-R-Sch 患者都存在持续的氧化应激,但只有 Non-R-Sch 患者的氧化 DNA 损伤明显高于对照组。这表明氧化应激可以通过 DNA 损伤引起疾病,氧化应激通过氧化 DNA 损伤在精神分裂症中起作用。

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