Key Laboratory of Quantum Information, CAS, University of Science and Technology of China, Hefei, Anhui 230026, China.
Nanoscale. 2015 Oct 28;7(40):16867-73. doi: 10.1039/c5nr04961j.
Two-dimensional layered materials, such as transition metal dichalcogenides (TMDCs), are promising materials for future electronics owing to their unique electronic properties. With the presence of a band gap, atomically thin gate defined quantum dots (QDs) can be achieved on TMDCs. Herein, standard semiconductor fabrication techniques are used to demonstrate quantum confined structures on WSe2 with tunnel barriers defined by electric fields, therefore eliminating the edge states induced by etching steps, which commonly appear in gapless graphene QDs. Over 40 consecutive Coulomb diamonds with a charging energy of approximately 2 meV were observed, showing the formation of a QD, which is consistent with the simulations. The size of the QD could be tuned over a factor of 2 by changing the voltages applied to the top gates. These results shed light on a way to obtain smaller quantum dots on TMDCs with the same top gate geometry compared to traditional GaAs/AlGaAs heterostructures with further research.
二维层状材料,如过渡金属二卤化物(TMDCs),由于其独特的电子特性,有望成为未来电子学的理想材料。由于存在带隙,在 TMDCs 上可以实现原子层薄的栅极定义量子点(QD)。在此,通过使用标准半导体制造技术,在 WSe2 上展示了由电场定义的隧道势垒的量子受限结构,从而消除了通常出现在无隙石墨烯 QD 中的蚀刻步骤引起的边缘态。观察到超过 40 个连续的库仑菱形,其充电能量约为 2meV,表明形成了一个 QD,这与模拟结果一致。通过改变施加到顶栅的电压,可以将 QD 的尺寸调谐超过 2 倍。这些结果为在 TMDCs 上获得比传统 GaAs/AlGaAs 异质结构更小的量子点提供了一种方法,并且可以通过进一步的研究来实现。