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纳米结构硼掺杂金刚石对人神经干细胞附着和增殖的生物相容性。

Biocompatibility of nanostructured boron doped diamond for the attachment and proliferation of human neural stem cells.

作者信息

Taylor Alice C, Vagaska Barbora, Edgington Robert, Hébert Clément, Ferretti Patrizia, Bergonzo Philippe, Jackman Richard B

机构信息

London Centre for Nanotechnology and Department of Electronic and Electrical and Engineering, University College London, 17-19 Gordon Street, London, WC1H 0AH, UK.

出版信息

J Neural Eng. 2015 Dec;12(6):066016. doi: 10.1088/1741-2560/12/6/066016. Epub 2015 Oct 15.

Abstract

OBJECTIVE

We quantitatively investigate the biocompatibility of chemical vapour deposited (CVD) nanocrystalline diamond (NCD) after the inclusion of boron, with and without nanostructuring. The nanostructuring method involves a novel approach of growing NCD over carbon nanotubes (CNTs) that act as a 3D scaffold. This nanostructuring of BNCD leads to a material with increased capacitance, and this along with wide electrochemical window makes BNCD an ideal material for neural interface applications, and thus it is essential that their biocompatibility is investigated.

APPROACH

Biocompatibility was assessed by observing the interaction of human neural stem cells (hNSCs) with a variety of NCD substrates including un-doped ones, and NCD doped with boron, which are both planar, and nanostructured. hNSCs were chosen due to their sensitivity, and various methods including cell population and confluency were used to quantify biocompatibility.

MAIN RESULTS

Boron inclusion into NCD film was shown to have no observable effect on hNSC attachment, proliferation and viability. Furthermore, the biocompatibility of nanostructured boron-doped NCD is increased upon nanostructuring, potentially due to the increased surface area.

SIGNIFICANCE

Diamond is an attractive material for supporting the attachment and development of cells as it can show exceptional biocompatibility. When boron is used as a dopant within diamond it becomes a p-type semiconductor, and at high concentrations the diamond becomes quasi-metallic, offering the prospect of a direct electrical device-cell interfacing system.

摘要

目的

我们定量研究了化学气相沉积(CVD)的纳米晶金刚石(NCD)在掺杂硼后(有无纳米结构)的生物相容性。纳米结构化方法涉及一种在用作三维支架的碳纳米管(CNT)上生长NCD的新方法。BNCD的这种纳米结构化导致材料电容增加,再加上宽电化学窗口,使得BNCD成为神经接口应用的理想材料,因此研究其生物相容性至关重要。

方法

通过观察人类神经干细胞(hNSC)与多种NCD基底(包括未掺杂的以及掺杂硼的平面和纳米结构化的NCD基底)的相互作用来评估生物相容性。选择hNSC是因为其敏感性,并使用包括细胞群体和汇合度在内的各种方法来量化生物相容性。

主要结果

结果表明,在NCD薄膜中掺入硼对hNSC的附着、增殖和活力没有可观察到的影响。此外,纳米结构化硼掺杂NCD的生物相容性在纳米结构化后增加,这可能是由于表面积增加所致。

意义

金刚石是一种有吸引力的用于支持细胞附着和发育的材料,因为它可以表现出卓越的生物相容性。当硼用作金刚石中的掺杂剂时,它会变成p型半导体,在高浓度下金刚石会变成准金属,这为直接的电气设备 - 细胞接口系统提供了前景。

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