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脉冲激光沉积铁硫族化合物薄膜中通过同质外延生长实现的界面控制。

Interface control by homoepitaxial growth in pulsed laser deposited iron chalcogenide thin films.

作者信息

Molatta Sebastian, Haindl Silvia, Trommler Sascha, Schulze Michael, Wurmehl Sabine, Hühne Ruben

机构信息

Dresden High Magnetic Field Laboratory (HLD-EMFL), Helmholtz-Zentrum Dresden-Rossendorf, D-01314 Dresden, Germany.

Dresden University of Technology, Department of Physics, D-01062 Dresden, Germany.

出版信息

Sci Rep. 2015 Nov 9;5:16334. doi: 10.1038/srep16334.

Abstract

Thin film growth of iron chalcogenides by pulsed laser deposition (PLD) is still a delicate issue in terms of simultaneous control of stoichiometry, texture, substrate/film interface properties, and superconducting properties. The high volatility of the constituents sharply limits optimal deposition temperatures to a narrow window and mainly challenges reproducibility for vacuum based methods. In this work we demonstrate the beneficial introduction of a semiconducting FeSe(1-x)Te(x) seed layer for subsequent homoepitaxial growth of superconducting FeSe(1-x)Te(x) thin film on MgO substrates. MgO is one of the most favorable substrates used in superconducting thin film applications, but the controlled growth of iron chalcogenide thin films on MgO has not yet been optimized and is the least understood. The large mismatch between the lattice constants of MgO and FeSe(1-x)Te(x) of about 11% results in thin films with a mixed texture, that prevents further accurate investigations of a correlation between structural and electrical properties of FeSe(1-x)Te(x). Here we present an effective way to significantly improve epitaxial growth of superconducting FeSe(1-x)Te(x) thin films with reproducible high critical temperatures (≥17 K) at reduced deposition temperatures (200 °C-320 °C) on MgO using PLD. This offers a broad scope of various applications.

摘要

通过脉冲激光沉积(PLD)法生长铁硫族化合物薄膜,在同时控制化学计量比、织构、衬底/薄膜界面性质和超导性质方面,仍然是一个棘手的问题。组分的高挥发性将最佳沉积温度急剧限制在一个狭窄的范围内,并且主要对基于真空的方法的可重复性构成挑战。在这项工作中,我们展示了引入半导体FeSe(1-x)Te(x)籽晶层对随后在MgO衬底上同质外延生长超导FeSe(1-x)Te(x)薄膜的有益作用。MgO是超导薄膜应用中最有利的衬底之一,但铁硫族化合物薄膜在MgO上的可控生长尚未得到优化,也是了解最少的。MgO和FeSe(1-x)Te(x)的晶格常数之间约11%的大失配导致薄膜具有混合织构,这阻碍了对FeSe(1-x)Te(x)结构和电学性质之间相关性的进一步精确研究。在此,我们提出了一种有效的方法,使用PLD在MgO上降低的沉积温度(200 °C - 320 °C)下,以可重复的高临界温度(≥17 K)显著改善超导FeSe(1-x)Te(x)薄膜的外延生长。这为各种应用提供了广阔的空间。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/efbd/4637838/b1aae0f6a9dd/srep16334-f1.jpg

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