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在Ag(1 1 1)上外延生长的六方(h)-AlN上生长锗烯的证据。

Evidence for Germanene growth on epitaxial hexagonal (h)-AlN on Ag(1 1 1).

作者信息

d'Acapito F, Torrengo S, Xenogiannopoulou E, Tsipas P, Marquez Velasco J, Tsoutsou D, Dimoulas A

机构信息

CNR-IOM-OGG c/o European Synchrotron Radiation Facility, 71 Avenue des Martyrs, F-38043 Grenoble, France.

出版信息

J Phys Condens Matter. 2016 Feb 3;28(4):045002. doi: 10.1088/0953-8984/28/4/045002. Epub 2016 Jan 11.

Abstract

In this work, a structural analysis of Ge layers deposited by molecular beam epitaxy (MBE) on Ag(1 1 1) surfaces with and without an AlN buffer layer have been investigated by x-ray Absorption Spectroscopy (XAS) at the Ge-K edge. For the Ge layers deposited on h-AlN buffer layer on Ag(1 1 1) an interatomic Ge-Ge distance [Formula: see text] Å is found, typical of 2-Dimensional Ge layers and in agreement with the theoretical predictions for free standing low-buckled Germanene presented in literature. First principles calculations, performed in the density functional theory (DFT) framework, supported the experimental RHEED and XAS findings, providing evidence for the epitaxial 2-D Ge layer formation on h-AlN/Ag(1 1 1) template.

摘要

在这项工作中,我们通过X射线吸收光谱(XAS)在Ge-K边对分子束外延(MBE)沉积在有和没有AlN缓冲层的Ag(1 1 1)表面上的Ge层进行了结构分析。对于沉积在Ag(1 1 1)上的h-AlN缓冲层上的Ge层,发现原子间Ge-Ge距离为[公式:见正文] Å,这是二维Ge层的典型特征,并且与文献中提出的独立低弯曲锗烯的理论预测一致。在密度泛函理论(DFT)框架下进行的第一性原理计算支持了实验性的反射高能电子衍射(RHEED)和XAS结果,为在h-AlN/Ag(1 1 1)模板上外延生长二维Ge层提供了证据。

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