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用于高频应用的覆铜层压板的热稳定低介电损耗硅氧烷杂化基质

Thermally Stable Siloxane Hybrid Matrix with Low Dielectric Loss for Copper-Clad Laminates for High-Frequency Applications.

机构信息

Laboratory of Optical Materials and Coating (LOMC) Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) , Daejeon, Republic of Korea.

出版信息

ACS Appl Mater Interfaces. 2016 Apr 6;8(13):8335-40. doi: 10.1021/acsami.6b01497. Epub 2016 Mar 22.

DOI:10.1021/acsami.6b01497
PMID:26982015
Abstract

We report vinyl-phenyl siloxane hybrid material (VPH) that can be used as a matrix for copper-clad laminates (CCLs) for high-frequency applications. The CCLs, with a VPH matrix fabricated via radical polymerization of resin blend consisting of sol-gel-derived linear vinyl oligosiloxane and bulky siloxane monomer, phenyltris(trimethylsiloxy)silane, achieve low dielectric constant (Dk) and dissipation factor (Df). The CCLs with the VPH matrix exhibit excellent dielectric performance (Dk = 2.75, Df = 0.0015 at 1 GHz) with stability in wide frequency range (1 MHz to 10 GHz) and at high temperature (up to 275 °C). Also, the VPH shows good flame resistance without any additives. These results suggest the potential of the VPH for use in high-speed IC boards.

摘要

我们报告了一种乙烯基苯基硅氧烷杂化材料(VPH),可作为用于高频应用的覆铜层压板(CCL)的基质。通过由溶胶-凝胶衍生的线性乙烯基低聚硅氧烷和大体积硅氧烷单体苯基三(三甲基硅氧基)硅烷的树脂共混物的自由基聚合制造的 CCL 具有低介电常数(Dk)和损耗因子(Df)。具有 VPH 基质的 CCL 表现出优异的介电性能(在 1 GHz 时为 Dk = 2.75,Df = 0.0015),在宽频率范围(1 MHz 至 10 GHz)和高温(高达 275°C)下稳定。此外,VPH 表现出良好的阻燃性,无需添加任何添加剂。这些结果表明 VPH 有用于高速集成电路板的潜力。

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