Sonier Marcus, Wronski Matt, Yeboah Collins
Sunnybrook Health Sciences Centre Odette Cancer Centre.
J Appl Clin Med Phys. 2015 Mar 8;17(2):304-314. doi: 10.1120/jacmp.v17i2.5713.
Lens dose is a concern during the treatment of facial lesions with anterior electron beams. Lead shielding is routinely employed to reduce lens dose and minimize late complications. The purpose of this work is twofold: 1) to measure dose pro-files under large-area lead shielding at the lens depth for clinical electron energies via film dosimetry; and 2) to assess the accuracy of the Pinnacle treatment planning system in calculating doses under lead shields. First, to simulate the clinical geometry, EBT3 film and 4 cm wide lead shields were incorporated into a Solid Water phantom. With the lead shield inside the phantom, the film was positioned at a depth of 0.7 cm below the lead, while a variable thickness of solid water, simulating bolus, was placed on top. This geometry was reproduced in Pinnacle to calculate dose profiles using the pencil beam electron algorithm. The measured and calculated dose profiles were normalized to the central-axis dose maximum in a homogeneous phantom with no lead shielding. The resulting measured profiles, functions of bolus thickness and incident electron energy, can be used to estimate the lens dose under various clinical scenarios. These profiles showed a minimum lead margin of 0.5 cm beyond the lens boundary is required to shield the lens to ≤ 10% of the dose maximum. Comparisons with Pinnacle showed a consistent overestimation of dose under the lead shield with discrepancies of ~ 25% occur-ring near the shield edge. This discrepancy was found to increase with electron energy and bolus thickness and decrease with distance from the lead edge. Thus, the Pinnacle electron algorithm is not recommended for estimating lens dose in this situation. The film measurements, however, allow for a reasonable estimate of lens dose from electron beams and for clinicians to assess the lead margin required to reduce the lens dose to an acceptable level.
在使用前部电子束治疗面部病变时,晶状体剂量是一个需要关注的问题。通常采用铅屏蔽来降低晶状体剂量并将晚期并发症降至最低。这项工作的目的有两个:1)通过胶片剂量测定法测量临床电子能量下大面积铅屏蔽在晶状体深度处的剂量分布;2)评估Pinnacle治疗计划系统在计算铅屏蔽下剂量时的准确性。首先,为了模拟临床几何形状,将EBT3胶片和4厘米宽的铅屏蔽纳入固体水模体中。铅屏蔽置于模体内,胶片位于铅下方0.7厘米深处,同时在顶部放置可变厚度的固体水模拟等效填充物。在Pinnacle中重现此几何形状,使用笔形束电子算法计算剂量分布。将测量和计算得到的剂量分布归一化为无铅屏蔽的均匀模体中的中心轴剂量最大值。所得的测量分布是等效填充物厚度和入射电子能量的函数,可用于估计各种临床情况下的晶状体剂量。这些分布表明,要将晶状体屏蔽至剂量最大值的≤10%,需要在晶状体边界之外至少0.5厘米的铅边距。与Pinnacle的比较表明,铅屏蔽下的剂量始终被高估,在屏蔽边缘附近差异约为25%。发现这种差异随电子能量和等效填充物厚度增加而增大,随离铅边距离减小而减小。因此,不建议在这种情况下使用Pinnacle电子算法来估计晶状体剂量。然而,胶片测量能够合理估计电子束的晶状体剂量,并让临床医生评估将晶状体剂量降低到可接受水平所需的铅边距。