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掺钛氧化硅钝化层极大地提高了基于赤铁矿的光电化学系统的性能。

A Titanium-Doped SiOx Passivation Layer for Greatly Enhanced Performance of a Hematite-Based Photoelectrochemical System.

机构信息

Center for Multidimensional Carbon Materials, Institute for Basic Science IBS, Ulsan, 44919, Republic of Korea.

School of Energy & Chemical Engineering, Low Dimensional Carbon Materials Center, UNIST, Ulsan, 44919, Republic of Korea.

出版信息

Angew Chem Int Ed Engl. 2016 Aug 16;55(34):9922-6. doi: 10.1002/anie.201603666. Epub 2016 Jun 30.

DOI:10.1002/anie.201603666
PMID:27358249
Abstract

This study introduces an in situ fabrication of nanoporous hematite with a Ti-doped SiOx passivation layer for a high-performance water-splitting system. The nanoporous hematite with a Ti-doped SiOx layer (Ti-(SiOx /np-Fe2 O3 )) has a photocurrent density of 2.44 mA cm(-2) at 1.23 VRHE and 3.70 mA cm(-2) at 1.50 VRHE . When a cobalt phosphate co-catalyst was applied to Ti-(SiOx /np-Fe2 O3 ), the photocurrent density reached 3.19 mA cm(-2) at 1.23 VRHE with stability, which shows great potential of the use of the Ti-doped SiOx layer with a synergistic effect of decreased charge recombination, the increased number of active sites, and the reduced hole-diffusion pathway from the hematite to the electrolyte.

摘要

本研究介绍了一种原位制备具有 Ti 掺杂 SiOx 钝化层的纳米多孔赤铁矿,用于高性能水分解系统。具有 Ti 掺杂 SiOx 层的纳米多孔赤铁矿(Ti-(SiOx /np-Fe2 O3 ))在 1.23 VRHE 时的光电流密度为 2.44 mA·cm-2 ,在 1.50 VRHE 时为 3.70 mA·cm-2 。当在 Ti-(SiOx /np-Fe2 O3 )上应用钴磷酸盐共催化剂时,在 1.23 VRHE 时的光电流密度达到 3.19 mA·cm-2 ,具有稳定性,这表明 Ti 掺杂 SiOx 层具有降低电荷复合、增加活性位点数量以及减少从赤铁矿到电解质的空穴扩散途径的协同效应,具有很大的应用潜力。

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