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六方氮化硼中单个缺陷的零声子线宽随温度可调的荧光发射。

Temperature Dependence of Wavelength Selectable Zero-Phonon Emission from Single Defects in Hexagonal Boron Nitride.

机构信息

Cornell University , Ithaca, New York 14853, United States.

University of Iowa , Iowa City, Iowa 52242, United States.

出版信息

Nano Lett. 2016 Oct 12;16(10):6052-6057. doi: 10.1021/acs.nanolett.6b01987. Epub 2016 Sep 6.

Abstract

We investigate the distribution and temperature-dependent optical properties of sharp, zero-phonon emission from defect-based single photon sources in multilayer hexagonal boron nitride (h-BN) flakes. We observe sharp emission lines from optically active defects distributed across an energy range that exceeds 500 meV. Spectrally resolved photon-correlation measurements verify single photon emission, even when multiple emission lines are simultaneously excited within the same h-BN flake. We also present a detailed study of the temperature-dependent line width, spectral energy shift, and intensity for two different zero-phonon lines centered at 575 and 682 nm, which reveals a nearly identical temperature dependence despite a large difference in transition energy. Our temperature-dependent results are well described by a lattice vibration model that considers piezoelectric coupling to in-plane phonons. Finally, polarization spectroscopy measurements suggest that whereas the 575 nm emission line is directly excited by 532 nm excitation, the 682 nm line is excited indirectly.

摘要

我们研究了在多层六方氮化硼(h-BN)薄片中基于缺陷的单光子源的尖锐零声子发射的分布和温度相关光学性质。我们观察到分布在超过 500 meV 的能量范围内的光学活性缺陷的尖锐发射线。光谱分辨的光子相关测量验证了单光子发射,即使在同一 h-BN 薄片中同时激发多个发射线。我们还对两个不同的零声子线的温度相关线宽、光谱能量位移和强度进行了详细研究,这两个零声子线的中心分别位于 575nm 和 682nm,尽管跃迁能量差异很大,但它们的温度依赖性几乎相同。我们的温度相关结果很好地由晶格振动模型描述,该模型考虑了与平面内声子的压电耦合。最后,偏振光谱测量表明,虽然 575nm 发射线直接由 532nm 激发,但是 682nm 线是间接激发的。

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