Song Youngjun, Takahashi Tsukasa, Kim Sejung, Heaney Yvonne C, Warner John, Chen Shaochen, Heller Michael J
Department of Electrical and Computer Engineering, ‡Department of Mechanical Engineering, §Department of Materials Science and Engineering, ∥Department of Nanoengineering, and ⊥Department of Bioengineering, University of California San Diego , La Jolla, California 92093-0448, United States.
ACS Appl Mater Interfaces. 2017 Jan 11;9(1):22-28. doi: 10.1021/acsami.6b11361. Epub 2016 Dec 29.
We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programmed DNA self-assembly and further UV patterning in the UV exposed and nonexposed areas. Multilayered DNA patterning with hybridization of fluorescently labeled complementary DNA sequences, biotin probe/fluorescent streptavidin complexes, and DNA patterns with 500 nm line widths were all demonstrated.
我们展示了一种DNA双写入过程，该过程利用紫外线对独特设计的DNA写入材料进行图案化，这种材料能产生两种不同的结合特性，用于杂交两种不同的互补DNA序列。该过程无需化学试剂对DNA进行修饰，并允许在紫外线照射区域和未照射区域进行程序化的DNA自组装以及进一步的紫外线图案化。我们还展示了多层DNA图案化，包括荧光标记的互补DNA序列杂交、生物素探针/荧光链霉亲和素复合物以及线宽为500纳米的DNA图案。
