Department of Electrical Engineering and ‡Department of Chemistry, National Tsing Hua University , Hsinchu 30013, Taiwan.
ACS Appl Mater Interfaces. 2017 May 3;9(17):14998-15004. doi: 10.1021/acsami.7b03597. Epub 2017 Apr 21.
The hole-injection barrier between the anode and the hole-injection layer (HIL) is of critical importance to determine the device performance of organic light-emitting diodes (OLEDs). Here, we report on a record-high external quantum efficiency (EQE) (24.6% in green phosphorescence) of OLEDs fabricated on both rigid and flexible substrates, with the performance enhanced by the use of nearly defect-free and high-mobility boron-doped graphene as an effective anode and hexaazatriphenylene hexacarbonitrile as a new type of HIL. This new structure outperforms the existing graphene-based OLEDs, in which MoO, AuCl, or bis(trifluoromethanesulfonyl)amide are typically used as a doping source for the p-type graphene. The improvement of the OLED performance is attributed mainly to the appreciable increase of the hole conductivity in the nearly defect-free boron-doped monolayer graphene, along with the high work function achieved by the use of a newly developed hydrocarbon precursor containing boron in the graphene growth by chemical vapor deposition.
空穴注入势垒在阳极和空穴注入层(HIL)之间对于决定有机发光二极管(OLED)的器件性能至关重要。在这里,我们报道了在刚性和柔性衬底上制造的 OLED 的创纪录的高光致发光外量子效率(EQE)(绿光磷光为 24.6%),其性能通过使用几乎无缺陷和高迁移率的硼掺杂石墨烯作为有效的阳极和六嗪三苯六碳二腈作为新型 HIL 得到了增强。这种新结构优于现有的基于石墨烯的 OLED,其中 MoO、AuCl 或双(三氟甲磺酰基)酰胺通常用作 p 型石墨烯的掺杂源。OLED 性能的提高主要归因于在几乎无缺陷的硼掺杂单层石墨烯中,空穴电导率的显著增加,以及通过使用在化学气相沉积中生长石墨烯的含有硼的新型碳氢化合物前体实现的高功函数。