School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.
Nanoscale. 2017 May 18;9(19):6370-6379. doi: 10.1039/c7nr01166k.
Understanding the mechanical behaviors of encapsulation barriers under bending stress is important when fabricating flexible organic light-emitting diodes (FOLEDs). The enhanced mechanical characteristics of a nano-stratified barrier were analyzed based on a defect suppression mechanism, and then experimentally demonstrated. Following the Griffith model, naturally-occurring cracks, which were caused by Zn etching at the interface of the nano-stratified structure, can curb the propagation of defects. Cross-section images after bending tests provided remarkable evidence to support the existence of a defect suppression mechanism. Many visible cracks were found in a single AlO layer, but not in the nano-stratified structure, due to the mechanism. The nano-stratified structure also enhanced the barrier's physical properties by changing the crystalline phase of ZnO. In addition, experimental results demonstrated the effect of the mechanism in various ways. The nano-stratified barrier maintained a low water vapor transmission rate after 1000 iterations of a 1 cm bending radius test. Using this mechanically enhanced hybrid nano-stratified barrier, FOLEDs were successfully encapsulated without losing mechanical or electrical performance. Finally, comparative lifetime measurements were conducted to determine reliability. After 2000 hours of constant current driving and 1000 iterations with a 1 cm bending radius, the FOLEDs retained 52.37% of their initial luminance, which is comparable to glass-lid encapsulation, with 55.96% retention. Herein, we report a mechanically enhanced encapsulation technology for FOLEDs using a nano-stratified structure with a defect suppression mechanism.
理解弯曲应力下封装屏障的机械行为对于制造柔性有机发光二极管(FOLED)非常重要。基于缺陷抑制机制分析了纳米分层屏障的增强机械特性,并进行了实验验证。根据格里菲斯模型,由于 Zn 在纳米分层结构界面处的蚀刻而产生的自然裂纹可以抑制缺陷的传播。弯曲测试后的横截面图像提供了明显的证据来支持缺陷抑制机制的存在。由于该机制,在单个 AlO 层中发现了许多可见的裂纹,但在纳米分层结构中没有发现。纳米分层结构还通过改变 ZnO 的晶相来增强屏障的物理性质。此外,实验结果以各种方式证明了该机制的效果。纳米分层屏障在经过 1000 次 1 cm 弯曲半径测试后,仍保持较低的水蒸气透过率。使用这种机械增强的混合纳米分层屏障,成功地封装了 FOLED,而不会损失机械或电气性能。最后,进行了比较寿命测量以确定可靠性。经过 2000 小时的恒流驱动和 1000 次 1 cm 弯曲半径的测试,FOLED 保留了初始亮度的 52.37%,与玻璃盖封装相当,保留了 55.96%。在这里,我们报告了一种使用具有缺陷抑制机制的纳米分层结构的 FOLED 机械增强封装技术。