Applied Physics Program, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.
Center for Nanoscale Materials, Argonne National Laboratory, 9700 S Cass Avenue, Argonne, IL, 60439, USA.
Sci Rep. 2017 Jun 12;7(1):3324. doi: 10.1038/s41598-017-03594-z.
Three-dimensional confinement allows semiconductor quantum dots to exhibit size-tunable electronic and optical properties that enable a wide range of opto-electronic applications from displays, solar cells and bio-medical imaging to single-electron devices. Additional modalities such as spin and valley properties in monolayer transition metal dichalcogenides provide further degrees of freedom requisite for information processing and spintronics. In nanostructures, however, spatial confinement can cause hybridization that inhibits the robustness of these emergent properties. Here, we show that laterally-confined excitons in monolayer MoS nanodots can be created through top-down nanopatterning with controlled size tunability. Unlike chemically-exfoliated monolayer nanoparticles, the lithographically patterned monolayer semiconductor nanodots down to a radius of 15 nm exhibit the same valley polarization as in a continuous monolayer sheet. The inherited bulk spin and valley properties, the size dependence of excitonic energies, and the ability to fabricate MoS nanostructures using semiconductor-compatible processing suggest that monolayer semiconductor nanodots have potential to be multimodal building blocks of integrated optoelectronics and spintronics systems.
三维限制使得半导体量子点表现出尺寸可调的电子和光学性质,从而实现了从显示、太阳能电池和生物医学成像到单电子器件等各种光电应用。单层过渡金属二卤化物中的自旋和谷性质等附加模态为信息处理和自旋电子学提供了进一步的自由度。然而,在纳米结构中,空间限制会导致杂化,从而抑制这些新兴性质的稳健性。在这里,我们通过具有可控尺寸可调性的自上而下的纳米图案化展示了在单层 MoS 纳米点中的横向限制激子的形成。与化学剥离的单层纳米颗粒不同,光刻图案化的单层半导体纳米点小至 15nm 的半径,表现出与连续单层薄片相同的谷极化。所继承的体自旋和谷性质、激子能量的尺寸依赖性以及使用半导体兼容工艺制造 MoS 纳米结构的能力表明,单层半导体纳米点有可能成为集成光电和自旋电子系统的多模态构建块。