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基于嵌入聚苯乙烯聚合物层中的氧化石墨烯的三元电阻开关存储行为。

Ternary Resistance Switching Memory Behavior Based on Graphene Oxide Embedded in a Polystyrene Polymer Layer.

机构信息

HLJ Province Key Laboratories of Senior-education for Electronic Engineering, Heilongjiang University, Harbin, 150080, China.

Communication and Electronics Engineering Institute, Qiqihar University, Qiqihar, 161006, China.

出版信息

Sci Rep. 2017 Jun 21;7(1):3938. doi: 10.1038/s41598-017-04299-z.

Abstract

Nonvolatile ternary memory devices were fabricated using the composite of polystyrene (PS) and graphene oxide(GO) as active layers, which have an reliable intermediate state. The current-voltage (I-V) curves of the indium tin oxide (ITO)/PS+GO/Al device under the external applied voltages exhibited current tri-stability with three conductivity states, which clearly revealed ternary memory performance. Under the stimulus of the external voltage, a stable intermediate conductivity state was observed. In the write-read-erase-read test, the ITO/PS+GO/Al device exhibited rewritable, nonvolatile, ternary memory properties. The resistance as functions of the time indicated that three conductivity states held for 2 × 10 s, suggesting that the good stability of the ITO/PS+GO/Al devices. HRTEM and XPS observation indicated that the Al top electrode reacted with oxygen within in GO.

摘要

使用聚苯乙烯 (PS) 和氧化石墨烯 (GO) 的复合材料作为有源层制造了非易失性三元存储器器件,其具有可靠的中间状态。在外部施加电压下,铟锡氧化物 (ITO)/PS+GO/Al 器件的电流-电压 (I-V) 曲线表现出具有三种电导率状态的电流三稳定性,这清楚地显示出了三元存储性能。在外部电压的刺激下,观察到了稳定的中间电导率状态。在写入-读取-擦除-读取测试中,ITO/PS+GO/Al 器件表现出可重写、非易失性、三元存储特性。电阻随时间的变化表明,三种电导率状态持续了 2×10 s,这表明 ITO/PS+GO/Al 器件具有良好的稳定性。HRTEM 和 XPS 观察表明,Al 顶电极与 GO 内的氧发生了反应。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/eb3e/5479854/043d79b00d65/41598_2017_4299_Fig1_HTML.jpg

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