Department of Engineering Science, University of Oxford, Parks Road, Oxford, OX1 3PJ, UK.
Jeonju Center, Korea Basic Science Institute, Jeonju, Jeollabuk-do, 54907, Republic of Korea.
Adv Mater. 2017 Sep;29(33). doi: 10.1002/adma.201702206. Epub 2017 Jul 10.
Transition metal dichalcogenide (TMDC) monolayers are considered to be potential materials for atomically thin electronics due to their unique electronic and optical properties. However, large-area and uniform growth of TMDC monolayers with large grain sizes is still a considerable challenge. This report presents a simple but effective approach for large-scale and highly crystalline molybdenum disulfide monolayers using a solution-processed precursor deposition. The low supersaturation level, triggered by the evaporation of an extremely thin precursor layer, reduces the nucleation density dramatically under a thermodynamically stable environment, yielding uniform and clean monolayer films and large crystal sizes up to 500 µm. As a result, the photoluminescence exhibits only a small full-width-half-maximum of 48 meV, comparable to that of exfoliated and suspended monolayer crystals. It is confirmed that this growth procedure can be extended to the synthesis of other TMDC monolayers, and robust MoS /WS heterojunction devices are easily prepared using this synthetic procedure due to the large-sized crystals. The heterojunction device shows a fast response time (≈45 ms) and a significantly high photoresponsivity (≈40 AW ) because of the built-in potential and the majority-carrier transport at the n-n junction. These findings indicate an efficient pathway for the fabrication of high-performance 2D optoelectronic devices.
过渡金属二卤化物 (TMDC) 单层因其独特的电子和光学性质而被认为是原子薄电子学的潜在材料。然而,大面积和均匀生长具有大晶粒尺寸的 TMDC 单层仍然是一个相当大的挑战。本报告提出了一种使用溶液处理前体沉积的简单但有效的方法,可大规模、高结晶的二硫化钼单层。在热力学稳定的环境下,由极薄的前体层蒸发引发的低过饱和度会显著降低成核密度,从而得到均匀且清洁的单层膜和大至 500 µm 的大晶粒尺寸。结果,光致发光仅表现出 48 meV 的小半峰全宽,与剥离和悬浮单层晶体相当。可以确认,这种生长过程可以扩展到其他 TMDC 单层的合成,并且由于晶体较大,使用这种合成过程可以轻松制备出稳健的 MoS/WS 异质结器件。由于内置电势和 n-n 结处的多数载流子输运,该异质结器件表现出快速的响应时间(≈45 ms)和显著高的光响应率(≈40 AW )。这些发现为制造高性能二维光电设备提供了有效的途径。