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倾斜胶体光刻技术在非同心特征结构制造中的应用。

Oblique Colloidal Lithography for the Fabrication of Nonconcentric Features.

机构信息

Department of Chemistry, Texas A&M University , College Station, Texas 77843, United States.

School for Engineering of Matter, Transport and Energy, Arizona State University , 781 E. Terrace Road, Tempe, Arizona 85287, United States.

出版信息

ACS Nano. 2017 Jul 25;11(7):6594-6604. doi: 10.1021/acsnano.6b07867. Epub 2017 Jul 13.

Abstract

Herein, we describe the development of oblique colloidal lithography (OCL) and establish a systematic patterning strategy for creating libraries of nanosized nonconcentric plasmonic structures. This strategy combines OCL, capillary force lithography, and several wet and ion etching steps. Hexagonal arrays of nonconcentric gold features were created on glass substrates with highly controllable geometric parameters. The size, geometry, and eccentricity of the gold features could be independently tuned by controlling the experimental conditions. Gaps within surface elements could be shrunk to as small as 30 nm, while the total patterned area was about l cm. The goal was to devise a method that offers a high degree of control over the resolution and morphology of asymmetric structures without the need to resort to electron beam lithography. This technique also enabled the development of numerous surface patterns through the stepwise fabrication of separate elements. Complex features, including dots-surrounded nonconcentric targets, nonconcentric hexagram-disks, and nonconcentric annular aperture arrays, were demonstrated, and their optical properties were characterized. Indeed, spectroscopic studies and FDTD simulations demonstrated that Fano resonances could readily be generated by the nonconcentric gold features. Consequently, our patterning strategy should enable the high-throughput investigation of plasmonic coupling and Fano resonances as a function of the physical parameters of the elements within the nanopattern array.

摘要

在此,我们描述了倾斜胶体光刻(OCL)的发展,并建立了一种系统的图案化策略,用于创建纳米级非同心等离子体结构库。该策略结合了 OCL、毛细作用力光刻和几个湿刻和离子刻蚀步骤。在玻璃衬底上,通过 OCL、毛细作用力光刻和几个湿刻和离子刻蚀步骤,可以创建具有高度可控几何参数的非同心金特征的六边形阵列。通过控制实验条件,可以独立地调整金特征的尺寸、形状和偏心度。表面元素之间的间隙可以缩小到 30nm 左右,而总图案化面积约为 1cm。目标是设计一种方法,在不需要使用电子束光刻的情况下,对不对称结构的分辨率和形态提供高度的控制。该技术还通过分步制造单独的元件,实现了许多表面图案的开发。展示了复杂的特征,包括围绕非同心目标的点、非同心六边盘和非同心环形孔径阵列,并对其光学性质进行了表征。实际上,光谱研究和 FDTD 模拟表明,非同心金特征很容易产生 Fano 共振。因此,我们的图案化策略应该能够实现等离子体耦合和 Fano 共振的高通量研究,作为纳米图案阵列中元素的物理参数的函数。

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