González Gabriela B
Department of Physics, DePaul University, 2219 N. Kenmore Avenue, Chicago, IL 60614, USA.
Materials (Basel). 2012 May 11;5(5):818-850. doi: 10.3390/ma5050818.
Transparent conducting oxide (TCO) materials are implemented into a wide variety of commercial devices because they possess a unique combination of high optical transparency and high electrical conductivity. Created during the processing of the TCOs, defects within the atomic-scale structure are responsible for their desirable optical and electrical properties. Therefore, studying the defect structure is essential to a better understanding of the behavior of transparent conductors. X-ray and neutron scattering techniques are powerful tools to investigate the atomic lattice structural defects in these materials. This review paper presents some of the current developments in the study of structural defects in n-type TCOs using x-ray diffraction (XRD), neutron diffraction, extended x-ray absorption fine structure (EXAFS), pair distribution functions (PDFs), and x-ray fluorescence (XRF).
透明导电氧化物（TCO）材料因其具有高光学透明度和高电导率的独特组合，而被应用于各种各样的商业设备中。在TCOs的加工过程中产生的原子尺度结构内的缺陷，是其具有理想光学和电学性能的原因。因此，研究缺陷结构对于更好地理解透明导体的行为至关重要。X射线和中子散射技术是研究这些材料中原子晶格结构缺陷的有力工具。本文综述了利用X射线衍射（XRD）、中子衍射、扩展X射线吸收精细结构（EXAFS）、对分布函数（PDFs）和X射线荧光（XRF）研究n型TCOs结构缺陷的一些当前进展。
