Thin Film Nano Tech. Lab., Department of Electronics Engineering, Chang Gung University, 259 Wen-Hwa 1st Rd., Kwei-Shan, Tao-Yuan, 33302, Taiwan.
Electronics and Optoelectronics Research Laboratories, Industrial Technology Research Institute (ITRI), Hsinchu, 310, Taiwan.
Sci Rep. 2017 Sep 11;7(1):11240. doi: 10.1038/s41598-017-11657-4.
Formation-free multi-level resistive switching characteristics by using 10 nm-thick polycrystalline GeO film in a simple W/GeO/W structure and understanding of switching mechanism through redox reaction in HO/sarcosine sensing (or changing Ge°/Ge oxidation states under external bias) have been reported for the first time. Oxidation states of Ge/Ge are confirmed by both XPS and HO sensing of GeO membrane in electrolyte-insulator-semiconductor structure. Highly repeatable 1000 dc cycles and stable program/erase (P/E) endurance of >10 cycles at a small pulse width of 100 ns are achieved at a low operation current of 0.1 µA. The thickness of GeO layer is found to be increased to 12.5 nm with the reduction of polycrystalline grain size of <7 nm after P/E of 10 cycles, which is observed by high-resolution TEM. The switching mechanism is explored through redox reaction in GeO membrane by sensing 1 nM HO, which is owing to the change of oxidation states from Ge to Ge because of the enhanced O ions migration in memory device under external bias. In addition, sarcosine as a prostate cancer biomarker with low concentration of 50 pM to 10 µM is also detected.
首次报道了在简单的 W/GeO/W 结构中使用 10nm 厚的多晶 GeO 薄膜实现无定型多电平电阻开关特性,以及通过氧化还原反应(HO/sarcosine 传感中的(或在外部偏压下改变 Ge°/Ge 氧化态))理解开关机制。GeO 薄膜的 XPS 和 HO 传感证实了 Ge/Ge 的氧化态。在低操作电流 0.1µA 下,在小脉冲宽度 100ns 下实现了 1000 次直流循环的高度可重复和>10 次的稳定编程/擦除(P/E)耐久性。在 10 次 P/E 后,通过高分辨率 TEM 观察到,多晶晶粒尺寸减小到<7nm,GeO 层的厚度增加到 12.5nm。通过在记忆器件中外部偏压下增强的 O 离子迁移,在 GeO 薄膜中通过传感 1nM HO 进行的氧化还原反应探索了开关机制,这导致氧化态从 Ge 变为 Ge。此外,还检测到浓度为 50pM 至 10µM 的低浓度的脯氨酸作为前列腺癌生物标志物。