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通过碳化硼-羧酸表面钝化控制锗的功函数。

Work Function Control of Germanium through Carborane-Carboxylic Acid Surface Passivation.

机构信息

Department of Chemistry and Biochemistry, Hope College , Holland, Michigan 49423, United States.

出版信息

ACS Appl Mater Interfaces. 2017 Oct 11;9(40):34592-34596. doi: 10.1021/acsami.7b10596. Epub 2017 Oct 2.

DOI:10.1021/acsami.7b10596
PMID:28920673
Abstract

Self-assembled monolayers (SAMs) of carborane isomers with different dipole moments passivate germanium to modulate surface work function while maintaining chemical environment and surface energy. To identify head groups capable of monolayer formation on germanium surfaces, we studied thiol-, hydroxyl-, and carboxyl-terminated carboranes. These films were successfully formed with carboxylic acid head groups instead of the archetypal thiol, suggesting that the carborane cluster significantly affects headgroup reactivity. Film characterization included X-ray and ultraviolet photoelectron spectroscopies as well as contact angle goniometry. Using these carboranes, the germanium surface work function was tailored over 0.4 eV without significant changes to wetting properties.

摘要

具有不同偶极矩的碳硼烷异构体的自组装单层 (SAMs) 通过钝化锗来调节表面功函数,同时保持化学环境和表面能。为了确定能够在锗表面形成单层的头基,我们研究了带有巯基、羟基和羧基末端的碳硼烷。这些带有羧酸头基的薄膜成功形成,而不是典型的硫醇,这表明碳硼烷簇显著影响了头基的反应性。薄膜特性包括 X 射线和紫外光电子能谱以及接触角测量。使用这些碳硼烷,在不显著改变润湿性的情况下,可将锗表面功函数调节 0.4eV 以上。

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