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通过对栅极金属进行纹理化来调制薄膜晶体管特性。

Modulating Thin Film Transistor Characteristics by Texturing the Gate Metal.

作者信息

Nair Aswathi, Bhattacharya Prasenjit, Sambandan Sanjiv

机构信息

Department of Instrumentation and Applied Physics, Indian Institute of Science, Bangalore, 560012, India.

Department of Engineering, University of Cambridge, Cambridge, CB3 0FF, United Kingdom.

出版信息

Sci Rep. 2017 Dec 20;7(1):17932. doi: 10.1038/s41598-017-18111-5.

Abstract

The development of reliable, high performance integrated circuits based on thin film transistors (TFTs) is of interest for the development of flexible electronic circuits. In this work we illustrate the modulation of TFT transconductance via the texturing of the gate metal created by the addition of a conductive pattern on top of a planar gate. Texturing results in the semiconductor-insulator interface acquiring a non-planar geometry with local variations in the radius of curvature. This influences various TFT parameters such as the subthreshold slope, gate voltage at the onset of conduction, contact resistance and gate capacitance. Specific studies are performed on textures based on periodic striations oriented along different directions. Textured TFTs showed upto ±40% variation in transconductance depending on the texture orientation as compared to conventional planar gate TFTs. Analytical models are developed and compared with experiments. Gain boosting in common source amplifiers based on textured TFTs as compared to conventional TFTs is demonstrated.

摘要

基于薄膜晶体管(TFT)开发可靠、高性能的集成电路对于柔性电子电路的发展具有重要意义。在这项工作中,我们展示了通过在平面栅极顶部添加导电图案来对栅极金属进行纹理化处理,从而实现对TFT跨导的调制。纹理化处理使得半导体 - 绝缘体界面获得了非平面几何形状,其曲率半径存在局部变化。这会影响各种TFT参数,如亚阈值斜率、导通起始时的栅极电压、接触电阻和栅极电容。针对沿不同方向的周期性条纹纹理进行了具体研究。与传统平面栅极TFT相比,纹理化TFT的跨导根据纹理方向显示出高达±40%的变化。开发了分析模型并与实验进行了比较。结果表明,与传统TFT相比,基于纹理化TFT的共源放大器实现了增益提升。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/dcb1/5738405/798cf16f17bf/41598_2017_18111_Fig1_HTML.jpg

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