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原子尺度下对铝氧化的深入理解

Atomic-Scale Insights into the Oxidation of Aluminum.

机构信息

School of Materials, University of Manchester , Oxford Road, Manchester M13 9PL, United Kingdom.

Center for Functional Nanomaterials, Brookhaven National Laboratory , Upton, New York 11973, United States.

出版信息

ACS Appl Mater Interfaces. 2018 Jan 24;10(3):2230-2235. doi: 10.1021/acsami.7b17224. Epub 2018 Jan 10.

Abstract

The surface oxidation of aluminum is still poorly understood despite its vital role as an insulator in electronics, in aluminum-air batteries, and in protecting the metal against corrosion. Here we use atomic resolution imaging in an environmental transmission electron microscope (TEM) to investigate the mechanism of aluminum oxide formation. Harnessing electron beam sputtering we prepare a pristine, oxide-free metal surface in the TEM. This allows us to study, as a function of crystallographic orientation and oxygen gas pressure, the full oxide growth regime from the first oxide nucleation to a complete saturated, few-nanometers-thick surface film.

摘要

尽管铝的表面氧化在电子学中作为绝缘体、在铝空气电池中以及在保护金属免受腐蚀方面具有重要作用,但人们对其仍了解甚少。在此,我们使用环境透射电子显微镜(TEM)中的原子分辨率成像来研究氧化铝形成的机理。利用电子束溅射,我们在 TEM 中制备了原始的、无氧化物的金属表面。这使我们能够研究在不同的晶体取向和氧气气压条件下,从最初的氧化物成核到完全饱和的、几纳米厚的表面膜的完整氧化生长阶段。

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