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单层 InSe 的各向异性应变实现大范围可调带隙

Largely Tunable Band Structures of Few-Layer InSe by Uniaxial Strain.

机构信息

Collaborative Innovation Center of Advanced Microstructures , Nanjing 210093, China.

出版信息

ACS Appl Mater Interfaces. 2018 Jan 31;10(4):3994-4000. doi: 10.1021/acsami.7b17247. Epub 2018 Jan 22.

Abstract

Because of the strong quantum confinement effect, few-layer γ-InSe exhibits a layer-dependent band gap, spanning the visible and near infrared regions, and thus recently has been drawing tremendous attention. As a two-dimensional material, the mechanical flexibility provides an additional tuning knob for the electronic structures. Here, for the first time, we engineer the band structures of few-layer and bulk-like InSe by uniaxial tensile strain and observe a salient shift of photoluminescence peaks. The shift rate of the optical gap is approximately 90-100 meV per 1% strain for four- to eight-layer samples, which is much larger than that for the widely studied MoS monolayer. Density functional theory calculations well reproduce the observed layer-dependent band gaps and the strain effect and reveal that the shift rate decreases with the increasing layer number for few-layer InSe. Our study demonstrates that InSe is a very versatile two-dimensional electronic and optoelectronic material, which is suitable for tunable light emitters, photodetectors, and other optoelectronic devices.

摘要

由于强量子限制效应,少层γ-InSe 表现出与层相关的带隙,跨越可见光和近红外区域,因此最近引起了极大的关注。作为一种二维材料,其机械柔韧性为电子结构提供了一个额外的调谐旋钮。在这里,我们首次通过单轴拉伸应变工程化了少层和类似体相 InSe 的能带结构,并观察到光致发光峰的明显移动。对于四到八层的样品,光学带隙的移动速率约为每 1%应变 90-100meV,比广泛研究的 MoS 单层大得多。密度泛函理论计算很好地再现了观察到的与层相关的带隙和应变效应,并表明少层 InSe 的移动速率随层数的增加而减小。我们的研究表明,InSe 是一种非常通用的二维电子和光电材料,适用于可调谐光源、光电探测器和其他光电器件。

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