Shih An-Ci, Han Chi-Jui, Kuo Tsung-Cheng, Cheng Yun-Chien
Department of Mechanical Engineering, National Chiao Tung University, Hsinchu 300, Taiwan.
Nanomaterials (Basel). 2018 Mar 14;8(3):164. doi: 10.3390/nano8030164.
The deposition stability and homogeneity of microparticles improved with mask, lengthened nozzle and flow rate adjustment. The microparticles can be used to encapsulate monomers, before the monomers in the microparticles can be deposited onto a substrate for nanoscale self-assembly. For the uniformity of the synthesized nanofilm, the homogeneity of the deposited microparticles becomes an important issue. Based on the ANSYS simulation results, the effects of secondary flow were minimized with a lengthened nozzle. The ANSYS simulation was also used to investigate the ring-vortex generation and why the ring vortex can be eliminated by adding a mask with an aperture between the nozzle and deposition substrate. The experimental results also showed that particle deposition with a lengthened nozzle was more stable, while adding the mask stabilized deposition and diminished the ring-vortex contamination. The effects of flow rate and pressure were also investigated. Hence, the deposition stability and homogeneity of microparticles was improved.
通过使用掩膜、延长喷嘴和调节流速，微粒的沉积稳定性和均匀性得到了改善。这些微粒可用于封装单体，然后微粒中的单体可沉积到基板上进行纳米级自组装。对于合成纳米薄膜的均匀性而言，沉积微粒的均匀性成为一个重要问题。基于ANSYS模拟结果，延长喷嘴可使二次流的影响最小化。ANSYS模拟还用于研究环形涡旋的产生以及为何通过在喷嘴和沉积基板之间添加带孔的掩膜可消除环形涡旋。实验结果还表明，使用延长喷嘴时颗粒沉积更稳定，而添加掩膜可稳定沉积并减少环形涡旋污染。还研究了流速和压力的影响。因此，微粒的沉积稳定性和均匀性得到了提高。
