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迈向银的直接电子束写入的三维领域。

Towards the third dimension in direct electron beam writing of silver.

作者信息

Höflich Katja, Jurczyk Jakub Mateusz, Madajska Katarzyna, Götz Maximilian, Berger Luisa, Guerra-Nuñez Carlos, Haverkamp Caspar, Szymanska Iwona, Utke Ivo

机构信息

Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland.

Helmholtz-Zentrum Berlin für Materialien und Energie, Nanoscale Structures and Microscopic Analysis, Hahn-Meitner-Platz 1, 14109 Berlin, Germany.

出版信息

Beilstein J Nanotechnol. 2018 Mar 8;9:842-849. doi: 10.3762/bjnano.9.78. eCollection 2018.

DOI:10.3762/bjnano.9.78
PMID:29600145
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC5852464/
Abstract

Carboxylates constitute an extremely promising class of precursor compounds for the electron beam induced deposition of silver. In this work both silver 2,2-dimethylbutyrate and silver pentafluoropropionate were investigated with respect to their dwell-time-dependent deposition behavior and growth characteristics. While silver 2,2-dimethylbutyrate showed a strong depletion in the center of the impinging electron beam profile hindering any vertical growth, silver pentafluoropropionate indicated a pronounced dependency of the deposit height on the dwell time. Truly three-dimensional silver structures could be realized with silver pentafluoropropionate. The pillars were polycrystalline with silver contents of more than 50 atom % and exhibit strong Raman enhancement. This constitutes a promising route towards the direct electron beam writing of three-dimensional plasmonic device parts from the gas phase.

摘要

羧酸盐是电子束诱导沉积银极具前景的一类前驱体化合物。在这项工作中,对2,2 - 二甲基丁酸银和五氟丙酸银的驻留时间依赖性沉积行为及生长特性进行了研究。虽然2,2 - 二甲基丁酸银在入射电子束轮廓中心显示出强烈的耗尽,阻碍了任何垂直生长,但五氟丙酸银表明沉积物高度对驻留时间有明显依赖性。使用五氟丙酸银可以实现真正的三维银结构。这些柱子是多晶的,银含量超过50原子%,并表现出强烈的拉曼增强。这构成了一条从气相直接电子束写入三维等离子体器件部件的有前途的途径。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/100b/5852464/2bf7b1483d73/Beilstein_J_Nanotechnol-09-842-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/100b/5852464/ef6333c12319/Beilstein_J_Nanotechnol-09-842-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/100b/5852464/8054ee8f5f97/Beilstein_J_Nanotechnol-09-842-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/100b/5852464/2bf7b1483d73/Beilstein_J_Nanotechnol-09-842-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/100b/5852464/ef6333c12319/Beilstein_J_Nanotechnol-09-842-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/100b/5852464/8054ee8f5f97/Beilstein_J_Nanotechnol-09-842-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/100b/5852464/2bf7b1483d73/Beilstein_J_Nanotechnol-09-842-g004.jpg

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