仿生 moth-eye 纳米制造：具有卓越自清洁特性的增强抗反射。
Biomimetic Moth-eye Nanofabrication: Enhanced Antireflection with Superior Self-cleaning Characteristic.
机构信息
College of Mechanical and Electrical Engineering, Beijing University of Chemical Technology, Beijing, 100029, China.
Department of Chemical and Biomolecular Engineering, The Ohio State University, Columbus, OH, 43210, USA.
出版信息
Sci Rep. 2018 Apr 3;8(1):5438. doi: 10.1038/s41598-018-23771-y.
Sub-wavelength antireflection moth-eye structures were fabricated with Nickel mold using Roll-to-Plate (R2P) ultraviolet nanoimprint lithography (UV-NIL) on transparent polycarbonate (PC) substrates. Samples with well replicated patterns established an average reflection of 1.21% in the visible light range, 380 to 760 nm, at normal incidence. An excellent antireflection property of a wide range of incidence angles was shown with the average reflection below 4% at 50°. Compared with the unpatterned ultraviolet-curable resin coating, the resulting sub-wavelength moth-eye structure also exhibited increased hydrophobicity in addition to antireflection. This R2P method is especially suitable for large-area product preparation and the biomimetic moth-eye structure with multiple performances can be applied to optical devices such as display screens, solar cells, or light emitting diodes.
采用 Roll-to-Plate（R2P）紫外纳米压印光刻（UV-NIL）在透明聚碳酸酯（PC）衬底上用镍模具制备了亚波长抗反射 moth-eye 结构。具有良好复制图案的样品在可见光范围内（380 至 760nm）建立了平均反射率为 1.21%，入射角为 0。显示出宽入射角范围的优异抗反射性能，在 50°时平均反射率低于 4%。与未图案化的紫外光固化树脂涂层相比，所得亚波长 moth-eye 结构除了抗反射外还表现出增加的疏水性。这种 R2P 方法特别适用于大面积产品制备，并且具有多种性能的仿生 moth-eye 结构可以应用于显示屏幕、太阳能电池或发光二极管等光学器件。
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