Department of Mechanical Engineering, Faculty of Engineering Sciences, Ben-Gurion University of the Negev, Israel.
Nanoscale. 2018 Jul 13;10(27):13022-13027. doi: 10.1039/c8nr01065j.
Gallium sulphide (GaS), gallium selenide (GaSe), and gallium telluride (GaTe), belonging to the group-III monochalcogenide family, have shown promising optoelectronic performance over graphene and monolayer molybdenum disulphide (MoS2). However, to date, the mechanical properties of these materials have not been investigated, which hinders their utilisation in flexible electronics and optomechanics. Here, we characterize the elastic properties and breaking strengths of suspended two-dimensional (2D) nanosheets of GaS, GaSe, and GaTe, using atomic force microscopy. The 2D Young's modulus values of ∼10 nm thick GaS, GaSe, and GaTe were found to be 1732 ± 154 N m-1, 819 ± 127 N m-1, and 246 ± 160 N m-1, respectively, corresponding to the three-dimensional (3D) Young's modulus values of 173 ± 15 GPa, 81.9 ± 12.7 GPa, and 24.6 ± 16 GPa, respectively. The pre-tension values of these nanosheets were estimated to be 0.34 ± 0.12 N m-1, 0.14 ± 0.04 N m-1, and 0.15 ± 0.03 N m-1 for GaS, GaSe, and GaTe, respectively. GaS nanosheets exhibited the highest Young's modulus (173 GPa) among these nanosheets, which is comparable to that of WS2 and WSe2. A failure characteristic study over these group-III monochalcogenides revealed that these materials can withstand stresses of up to 8 GPa and a maximal strain of 7% before breaking. Altogether, our findings indicate that GaS, GaSe, and GaTe are attractive candidates for use in stretchable electronic applications and in future optomechanical devices.
硫化镓(GaS)、硒化镓(GaSe)和碲化镓(GaTe)属于 III 族单硫族化物家族,在光电性能方面优于石墨烯和单层二硫化钼(MoS2)。然而,迄今为止,这些材料的力学性能尚未得到研究,这阻碍了它们在柔性电子学和光机械中的应用。在这里,我们使用原子力显微镜对悬浮二维(2D)纳米片的弹性性质和断裂强度进行了表征。GaS、GaSe 和 GaTe 的 2D 杨氏模量值约为 10nm 厚,分别为 1732 ± 154 N m-1、819 ± 127 N m-1 和 246 ± 160 N m-1,相应的三维(3D)杨氏模量值分别为 173 ± 15 GPa、81.9 ± 12.7 GPa 和 24.6 ± 16 GPa。这些纳米片的预张力值估计分别为 0.34 ± 0.12 N m-1、0.14 ± 0.04 N m-1 和 0.15 ± 0.03 N m-1,用于 GaS、GaSe 和 GaTe。GaS 纳米片表现出最高的杨氏模量(173GPa),与 WS2 和 WSe2 相当。对这些 III 族单硫族化物的失效特性研究表明,这些材料在断裂前能够承受高达 8GPa 的应力和 7%的最大应变。总的来说,我们的研究结果表明,GaS、GaSe 和 GaTe 是用于可拉伸电子应用和未来光机械装置的有吸引力的候选材料。