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一种由电容耦合结构增强的互补金属氧化物半导体微机电系统湿度传感器。

A CMOS MEMS Humidity Sensor Enhanced by a Capacitive Coupling Structure.

作者信息

Huang Jian-Qiu, Li Baoye, Chen Wenhao

机构信息

Key Laboratory of MEMS of the Ministry of Education, Southeast University, Sipailou 2, Nanjing 210096, China.

出版信息

Micromachines (Basel). 2016 Apr 26;7(5):74. doi: 10.3390/mi7050074.

Abstract

A capacitive coupling structure is developed to improve the performances of a capacitive complementary metal oxide semiconductor (CMOS) microelectromechanical system (MEMS) humidity sensor. The humidity sensor was fabricated by a post-CMOS process. Silver nanowires were dispersed onto the top of a conventional interdigitated capacitive structure to form a coupling electrode. Unlike a conventional structure, a thinner sensitive layer was employed to increase the coupling capacitance which dominated the sensitive capacitance of the humidity sensor. Not only static properties but also dynamic properties were found to be better with the aid of coupling capacitance. At 25 °C, the sensitive capacitance was 11.3 pF, the sensitivity of the sensor was measured to be 32.8 fF/%RH and the hysteresis was measured to be 1.0 %RH. Both a low temperature coefficient and a fast response (10 s)/recovery time (17 s) were obtained.

摘要

开发了一种电容耦合结构以改善电容式互补金属氧化物半导体(CMOS)微机电系统(MEMS)湿度传感器的性能。该湿度传感器采用CMOS后工艺制造。将银纳米线分散在传统叉指电容结构的顶部以形成耦合电极。与传统结构不同,采用了更薄的敏感层来增加耦合电容,该耦合电容主导了湿度传感器的敏感电容。借助耦合电容,发现不仅静态特性而且动态特性都更好。在25°C时,敏感电容为11.3 pF,传感器的灵敏度测得为32.8 fF/%RH,滞后测得为1.0 %RH。同时获得了低温度系数和快速响应(10 s)/恢复时间(17 s)。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/36bb/6190121/1c70b6a37f85/micromachines-07-00074-g001.jpg

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