Yeon Simo, Park Jeanho, Lee Hye-Jin
Korea Institute of Industrial Technology, 143 Hanggaulro, Sangnok-gu, Ansan-si, Gyeonggi-do 15588, Korea.
Micromachines (Basel). 2016 May 24;7(6):95. doi: 10.3390/mi7060095.
Wafer-level packaging (WLP) is a next-generation semiconductor packaging technology that is important for realizing high-performance and ultra-thin semiconductor devices. However, the molding process, which is a part of the WLP process, has various problems such as a high defect rate and low predictability. Among the various defect factors, the die shift primarily determines the quality of the final product; therefore, predicting the die shift is necessary to achieve high-yield production in WLP. In this study, the die shift caused by the flow drag force of the epoxy molding compound (EMC) is evaluated from the die shift of a debonded molding wafer. Experimental and analytical methods were employed to evaluate the die shift occurring during each stage of the molding process and that resulting from the geometrical changes after the debonding process. The die shift caused by the EMC flow drag force is evaluated from the data on die movements due to thermal contraction/expansion and warpage. The relationship between the die shift and variation in the die gap is determined through regression analysis in order to predict the die shift due to the flow drag force. The results can be used for die realignment by predicting and compensating for the die shift.
晶圆级封装(WLP)是一种下一代半导体封装技术,对于实现高性能和超薄半导体器件至关重要。然而,作为WLP工艺一部分的模塑工艺存在各种问题,如高缺陷率和低可预测性。在各种缺陷因素中,芯片偏移主要决定最终产品的质量;因此,预测芯片偏移对于在WLP中实现高产量生产是必要的。在本研究中,从脱粘模塑晶圆的芯片偏移来评估由环氧模塑化合物(EMC)的流动拖曳力引起的芯片偏移。采用实验和分析方法来评估模塑工艺各阶段发生的芯片偏移以及脱粘工艺后几何变化导致的芯片偏移。由EMC流动拖曳力引起的芯片偏移是根据热收缩/膨胀和翘曲导致的芯片移动数据来评估的。通过回归分析确定芯片偏移与芯片间隙变化之间的关系,以便预测由流动拖曳力引起的芯片偏移。这些结果可用于通过预测和补偿芯片偏移来进行芯片重新对准。