Condensed Matter and Interfaces, Debye Institute for Nanomaterials Science, Utrecht University, Utrecht, The Netherlands.
Molecular Biophysics, Debye Institute for Nanomaterials Science, Utrecht University, Utrecht, The Netherlands.
J Microsc. 2019 Apr;274(1):13-22. doi: 10.1111/jmi.12778. Epub 2019 Jan 16.
Fiducial markers are used in correlated light and electron microscopy (CLEM) to enable accurate overlaying of fluorescence and electron microscopy images. Currently used fiducial markers, e.g. dye-labelled nanoparticles and quantum dots, suffer from irreversible quenching of the luminescence after electron beam exposure. This limits their use in CLEM, since samples have to be studied with light microscopy before the sample can be studied with electron microscopy. Robust fiducial markers, i.e. luminescent labels that can (partially) withstand electron bombardment, are interesting because of the recent development of integrated CLEM microscopes. In addition, nonintegrated CLEM setups may benefit from such fiducial markers. Such markers would allow switching back from EM to LM and are not available yet. Here, we investigate the robustness of various luminescent nanoparticles (NPs) that have good contrast in electron microscopy; 130 nm gold-core rhodamine B-labelled silica particles, 15 nm CdSe/CdS/ZnS core-shell-shell quantum dots (QDs) and 230 nm Y O :Eu particles. Robustness is studied by measuring the luminescence of (single) NPs after various cycles of electron beam exposure. The gold-core rhodamine B-labelled silica NPs and QDs are quenched after a single exposure to 60 ke nm with an energy of 120 keV, while Y O :Eu NPs are robust and still show luminescence after five doses of 60 ke nm . In addition, the luminescence intensity of Y O :Eu NPs is investigated as function of electron dose for various electron fluxes. The luminescence intensity initially drops to a constant value well above the single particle detection limit. The intensity loss does not depend on the electron flux, but on the total electron dose. The results indicate that Y O :Eu NPs are promising as robust fiducial marker in CLEM. LAY DESCRIPTION: Luminescent particles are used as fiducial markers in correlative light and electron microscopy (CLEM) to enable accurate overlaying of fluorescence and electron microscopy images. The currently used fiducial markers, e.g. dyes and quantum dots, loose their luminescence after exposure to the electron beam of the electron microscope. This limits their use in CLEM, since samples have to be studied with light microscopy before the sample can be studied with electron microscopy. Robust fiducial markers, i.e. luminescent labels that can withstand electron exposure, are interesting because of recent developments in integrated CLEM microscopes. Also nonintegrated CLEM setups may benefit from such fiducial markers. Such markers would allow for switching back to fluorescence imaging after the recording of electron microscopy imaging and are not available yet. Here, we investigate the robustness of various luminescent nanoparticles (NPs) that have good contrast in electron microscopy; dye-labelled silica particles, quantum dots and lanthanide-doped inorganic particles. Robustness is studied by measuring the luminescence of (single) NPs after various cycles of electron beam exposure. The dye-labelled silica NPs and QDs are quenched after a single exposure to 60 ke nm with an energy of 120 keV, while lanthanide-doped inorganic NPs are robust and still show luminescence after five doses of 60 ke nm . In addition, the luminescence intensity of lanthanide-doped inorganic NPs is investigated as function of electron dose for various electron fluxes. The luminescence intensity initially drops to a constant value well above the single particle detection limit. The intensity loss does not depend on the electron flux, but on the total electron dose. The results indicate that lanthanide-doped NPs are promising as robust fiducial marker in CLEM.
荧光相关和电子显微镜(CLEM)中使用基准标记物来实现荧光和电子显微镜图像的精确叠加。目前使用的基准标记物,例如荧光染料标记的纳米粒子和量子点,在电子束照射后会发生不可逆的荧光猝灭。这限制了它们在 CLEM 中的应用,因为在对样品进行电子显微镜研究之前,必须先对样品进行荧光显微镜研究。坚固的基准标记物,即可以(部分)耐受电子束轰击的发光标签,由于集成 CLEM 显微镜的最新发展而变得有趣。此外,非集成 CLEM 设备也可能受益于这种基准标记物。这种标记物允许从 EM 切换回 LM,并且尚未实现。在这里,我们研究了各种在电子显微镜中具有良好对比度的发光纳米粒子(NPs)的坚固性;130nm 金核罗丹明 B 标记的硅颗粒、15nm CdSe/CdS/ZnS 核壳壳量子点(QD)和 230nm Y O:Eu 颗粒。通过测量(单个)NPs 在多次电子束照射后的发光来研究坚固性。金核罗丹明 B 标记的硅 NPs 和 QDs 在单次暴露于能量为 120keV 的 60keVnm 时被猝灭,而 Y O:Eu NPs 坚固耐用,在五次 60keVnm 剂量后仍显示出发光。此外,还研究了 Y O:Eu NPs 的发光强度作为各种电子通量的电子剂量的函数。发光强度最初下降到远高于单个粒子检测限的恒定值。强度损失与电子通量无关,而与总电子剂量有关。结果表明,Y O:Eu NPs 有望成为 CLEM 中的坚固基准标记物。