Chen Yu-Chen, Salter Patrick S, Niethammer Matthias, Widmann Matthias, Kaiser Florian, Nagy Roland, Morioka Naoya, Babin Charles, Erlekampf Jürgen, Berwian Patrick, Booth Martin J, Wrachtrup Jörg
Third Institute of Physics , University of Stuttgart and Institute for Quantum Science and Technology IQST , Stuttgart 70569 , Germany.
Department of Engineering Science , University of Oxford , Parks Road , Oxford OX1 3PJ , United Kingdom.
Nano Lett. 2019 Apr 10;19(4):2377-2383. doi: 10.1021/acs.nanolett.8b05070. Epub 2019 Mar 20.
Single photon emitters in silicon carbide (SiC) are attracting attention as quantum photonic systems ( Awschalom et al. Nat. Photonics 2018 , 12 , 516 - 527 ; Atatüre et al. Nat. Rev. Mater. 2018 , 3 , 38 - 51 ). However, to achieve scalable devices, it is essential to generate single photon emitters at desired locations on demand. Here we report the controlled creation of single silicon vacancy (V) centers in 4H-SiC using laser writing without any postannealing process. Due to the aberration correction in the writing apparatus and the nonannealing process, we generate single V centers with yields up to 30%, located within about 80 nm of the desired position in the transverse plane. We also investigated the photophysics of the laser writing V centers and concluded that there are about 16 photons involved in the laser writing V center process. Our results represent a powerful tool in the fabrication of single V centers in SiC for quantum technologies and provide further insights into laser writing defects in dielectric materials.
碳化硅(SiC)中的单光子发射器作为量子光子系统正受到关注(阿沙洛姆等人,《自然·光子学》2018年,第12卷,第516 - 527页;阿塔图雷等人,《自然·材料评论》2018年,第3卷,第38 - 51页)。然而,要实现可扩展的器件,按需在所需位置生成单光子发射器至关重要。在此,我们报告了使用激光写入在4H - SiC中可控地创建单个硅空位(V)中心,且无需任何后退火工艺。由于写入设备中的像差校正和无退火工艺,我们生成了产率高达30%的单个V中心,其在横向平面内位于距所需位置约80纳米范围内。我们还研究了激光写入V中心的光物理过程,并得出激光写入V中心过程中约涉及16个光子的结论。我们的结果代表了一种用于在SiC中制造单V中心以用于量子技术的强大工具,并为深入了解介电材料中的激光写入缺陷提供了进一步的见解。