Soto-Montero Tatiana, Morales-Masis Monica
MESA+ Institute for Nanotechnology, University of Twente, Enschede 7500 AE, The Netherlands.
ACS Energy Lett. 2024 Aug 1;9(8):4199-4208. doi: 10.1021/acsenergylett.4c01466. eCollection 2024 Aug 9.
Vacuum-based or vapor-phase deposition is the most mature and widely used method for thin-film growth in the semiconductor industry. Yet, the vapor-phase growth of halide perovskites remains relatively underexplored compared to solution process deposition. The intrinsically largely distinct volatilities of organic and inorganic components in halide perovskites challenge the standard physical vapor deposition techniques. Thermal coevaporation tackles this with independent thermally controlled sources per precursor. Alternatively, pulsed laser deposition uses the energy of a laser to eject material from a target via thermal and nonthermal processes. This provides high versatility in the target composition, enabling the deposition of complex (including hybrid) thin films from a single-source target. This Perspective presents an overview of recent advances in laser-based deposition of halide perovskites, discusses advantages and challenges, and motivates the development of physical vapor deposition methods for hybrid materials, especially for applications requiring dry, conformal, and multilayer deposition.
基于真空或气相沉积是半导体行业中用于薄膜生长最成熟且应用最广泛的方法。然而，与溶液法沉积相比，卤化物钙钛矿的气相生长仍相对未得到充分探索。卤化物钙钛矿中有机和无机组分本质上显著不同的挥发性对标准物理气相沉积技术构成了挑战。热共蒸发通过对每个前驱体使用独立的热控源来解决这一问题。另外，脉冲激光沉积利用激光能量通过热过程和非热过程从靶材中喷射材料。这在靶材组成方面提供了高度的通用性，能够从单源靶材沉积复杂（包括混合）薄膜。本视角概述了基于激光的卤化物钙钛矿沉积的最新进展，讨论了优点和挑战，并推动了用于混合材料的物理气相沉积方法的发展，特别是对于需要干式、保形和多层沉积的应用。
